JJAP: Japanese Journal of Applied Physics
Comprehensive Review
–FREE ACCESS–
Technological Innovation of Thin-Film Transistors: Technology Develpment, History,
and Future
by Y. Yamamoto
Jpn. J. Appl. Phys. 51 (2012) 060001
Special Issue
–FREE ACCESS–
Solid State Devices and Materials II
Edited by J. Motohisa et al.
Vol. 51, No. 4, Issue 2 (April 2012)
Comprehensive Review
–FREE ACCESS–
Carbon Nanotube Research: Past and Future
by M. Endo
Jpn. J. Appl. Phys. 51 (2012) 040001
Special Section
–FREE ACCESS–
Centennial Anniversary of Superconductivity
Edited by I. Suemune et al.
Vol. 51, No. 1 (January 2012)
Invited Review Papers
Invited Rev. Papers Archive- Overview of Materials and Power Applications of Coated Conductors Project [51 (2012) 010007] by Yuh Shiohara, Takahiro Taneda, and Masateru Yoshizumi
- Recent Progress in Physics of High-Temperature Superconductors [51 (2012) 010004] by Takami Tohyama
- Frontiers of Research on Iron-Based Superconductors toward Their Application [51 (2012) 010005] by Keiichi Tanabe and Hideo Hosono
- Present Status and Future Perspective of Bismuth-Based High-Temperature Superconducting Wires Realizing Application Systems [51 (2012) 010006] by Ken-ichi Sato, Shin-ichi Kobayashi, and Takayoshi Nakashima
- Frequency Metrology with Optical Lattice Clocks [49 (2010) 080001] by Feng-Lei Hong and Hidetoshi Katori
- Radiation Chemistry in Chemically Amplified Resists [49 (2010) 030001] by Takahiro Kozawa and Seiichi Tagawa
- Electrical Phase-Change Memory: Fundamentals and State of the Art [48 (2009) 080001] by Motoyasu Terao, Takahiro Morikawa, and Takeo Ohta
- Resonant Tunneling Diodes for Sub-Terahertz and Terahertz Oscillators [47 (2008) 4375] by Masahiro Asada, Safumi Suzuki, and Naomichi Kishimoto
- Scanning Nonlinear Dielectric Microscopy Nano-Science and Technology for Next Generation High Density Ferroelectric Data Storage [47 (2008) 3311] by Kenkou Tanaka, Yuichi Kurihashi, Tomoya Uda, Yasuhiro Daimon, Nozomi Odagawa, Ryusuke Hirose, Yoshiomi Hiranaga, and Yasuo Cho
- Developments of Plasma Etching Technology for Fabricating Semiconductor Devices [47 (2008) 1435] by Haruhiko Abe, Masahiro Yoneda, and Nobuo Fujiwara
- Development of Electron Holography and Its Applications to Fundamental Problems in Physics [47 (2008) 11] by Akira Tonomura
-
New Vertical-Cavity Surface-Emitting Laser: Its Conception and Evolution
[47 (2008) 1] by Kenichi Iga
Comprehensive Reviews
- Technological Innovation of Thin-Film Transistors: Technology Develpment, History, and Future [51 (2012) 060001] by Yoshitaka Yamamoto
- Carbon Nanotube Research: Past and Future [51 (2012) 040001] by Morinobu Endo
- Superconductivity: 100th Anniversary of Its Discovery and Its Future [51 (2012) 010001] by Koichi Kitazawa
- Development and Prospects for the Future of Superconducting Wires [51 (2012) 010003] by Hiroaki Kumakura
- Forefront in the Elucidation of the Mechanism of High-Temperature Superconductivity [51 (2012) 010002] by Shin-ichi Uchida
- Present Status and Future Prospects of Quantum Information Processing: With Special Focus on Optically Controlled Semiconductor Spins and Single-Photon Technologies [50 (2011) 100001] by Yoshihisa Yamamoto
- High-Order Harmonic Generation and Attosecond Science [50 (2011) 090001] by Katsumi Midorikawa
- Cutting-Edge Technology of Bismuth-Based High-Temperature Superconducting Wires for Application in Energy- and Environment-Related Fields [50 (2011) 080001] by Kazuhiko Hayashi
- Present Status and Future Prospects of Silicon Thin-Film Solar Cells [50 (2011) 030001] by Makoto Konagai
- Creation and Control of Spin Current in Solids [49 (2010) 110001] by Koki Takanashi
- Current Status of Nonvolatile Semiconductor Memory Technology [49 (2010) 100001] by Yoshihisa Fujisaki
- On Degradation Studies of III–V Compound Semiconductor Optical Devices over Three Decades: Focusing on Gradual Degradation [49 (2010) 090001] by Osamu Ueda
Special Issues Vol. 51 (2012)
|
Solid State Devices and Materials II; No. 4, Issue 2 (April)
Edited by J. Motohisa et al. |
|
Active-Matrix Flatpanel Displays and Devices –TFT Technologies and FPD Materials–; No. 3, Issue 2 (March)
Edited by T. Asano et al. |
|
|
Solid State Devices and Materials I; No. 2, Issue 2 (February)
Edited by J. Motohisa et al. |
|
Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials; No. 1, Issue 2 (January)
Edited by A. Kono et al. |
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