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Japanese Journal of Applied Physics

Volume 50, Number 8, August 2011

Special Issue: Dry Process

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• Plasma and surface reaction
• Plasma diagnostics and simulation
• Plasma etching
• Plasma induced damage/device performance enhancement
• Thin film/nanostructure formation

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Plasma and surface reaction

08KA01 : Novel Precursors for SiCH Low-k Caps beyond the 22 nm Node: Reactions of Silacyclopentane Precursors in the Plasma-Enhanced Chemical Vapor Deposition Process and Structural Analyses of SiCH Films

Hideharu Shimizu, Nobuo Tajima, Takeshi Kada, Shuji Nagano, and Yukihiro Shimogaki
Published August 22, 2011 (9 pages)
[Abstract] [Full Text PDF (2077K)]

08KA02 : Surface Modification of Polypropylene Membrane by RF Methane/Oxygen Mixture Plasma Treatment

Ching-Yuan Tsai, Ruey-Shin Juang, and Chun Huang
Published August 22, 2011 (7 pages)
[Abstract] [Full Text PDF (1057K)]

08KA03 : Surface Treatment of Polymer Film by Atmospheric Pulsed Microplasma: Study on Gas Humidity Effect for Improving the Hydrophilic Property

Kazuo Shimizu, Akira Umeda, and Marius Blajan
Published August 22, 2011 (5 pages)
[Abstract] [Full Text PDF (1100K)]

08KA04 : Improving Single-Chamber Solid Oxide Fuel Cell Performance by Plasma Treatment Using an Atmospheric-Pressure Helium Plasma Jet

Seiji Kanazawa, Tadasuke Iwao, Shuichi Akamine, and Ryuta Ichiki
Published August 22, 2011 (5 pages)
[Abstract] [Full Text PDF (676K)]

Plasma diagnostics and simulation

08KB01 : Measurement of Negative Ions Generated on the Si Etched Surface

Toshio Hayashi, Sonomi Murai, Fumihiko Sato, Akihiro Kono, Naoki Mizutani, and Koukou Suu
Published August 22, 2011 (4 pages)
[Abstract] [Full Text PDF (550K)]

08KB02 : Molecular Dynamics Analysis of the Formation of Surface Roughness during Si Etching in Chlorine-Based Plasmas

Hirotaka Tsuda, Yoshinori Takao, Koji Eriguchi, and Kouichi Ono
Published August 22, 2011 (5 pages)
[Abstract] [Full Text PDF (1034K)]

08KB03 : Estimation of Ion/Radical Flux from Mask Selectivity and Etching Rate Calibrated by Topography Simulation

Toshimitsu Ohmine, Vaibhav Deshpande, Hideki Takada, Tomoharu Ikeda, Hirokazu Saito, Fumiaki Kawai, and Kimimori Hamada
Published August 22, 2011 (6 pages)
[Abstract] [Full Text PDF (995K)]

Plasma etching

08KC01 : Etch Properties of TiN Thin Film in Metal–Insulator–Metal Capacitor Using Inductively Coupled Plasma

Jung-Soo Park, Jong-Chang Woo, and Chang-Il Kim
Published August 22, 2011 (4 pages)
[Abstract] [Full Text PDF (1235K)]

08KC02 : Etch Characterization of TiO₂ Thin Films Using Metal–Insulator–Metal Capacitor in Adaptively Coupled Plasma

Jong-Chang Woo, Young-Hee Joo, and Chang-Il Kim
Published August 22, 2011 (6 pages)
[Abstract] [Full Text PDF (1367K)]

08KC03 : 25 nm Wide Silicon Trench Fabrication by Edge Lithography

Junji Sakamoto, Hiroaki Kawata, Masaaki Yasuda, and Yoshihiko Hirai
Published August 22, 2011 (5 pages)
[Abstract] [Full Text PDF (842K)]

Plasma induced damage/device performance enhancement

08KD01 : Damage Characteristics of TiO₂ Thin Film Surfaces Etched by Capacitively Coupled Radio Frequency Helium Plasmas

Retsuo Kawakami, Atsushi Takeichi, Masahito Niibe, Takeshi Inaoka, and Kikuo Tominaga
Published August 22, 2011 (4 pages)
[Abstract] [Full Text PDF (484K)]

08KD02 : Si Recess of Polycrystalline Silicon Gate Etching: Damage Enhanced by Ion Assisted Oxygen Diffusion

Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, and Satoshi Hamaguchi
Published August 22, 2011 (5 pages)
[Abstract] [Full Text PDF (591K)]

08KD03 : Advanced Contactless Analysis of Plasma-Induced Damage on Si by Temperature-Controlled Photoreflectance Spectroscopy

Asahiko Matsuda, Yoshinori Nakakubo, Yoshinori Takao, Koji Eriguchi, and Kouichi Ono
Published August 22, 2011 (7 pages)
[Abstract] [Full Text PDF (830K)]

08KD04 : Trade-Off Relationship between Si Recess and Defect Density Formed by Plasma-Induced Damage in Planar Metal–Oxide–Semiconductor Field-Effect Transistors and the Optimization Methodology

Koji Eriguchi, Yoshinori Nakakubo, Asahiko Matsuda, Masayuki Kamei, Yoshinori Takao, and Kouichi Ono
Published August 22, 2011 (6 pages)
[Abstract] [Full Text PDF (768K)]

08KD05 : Comparative Study of Plasma-Charging Damage in High-k Dielectric and p–n Junction and Their Effects on Off-State Leakage Current of Metal–Oxide–Semiconductor Field-Effect Transistors

Masayuki Kamei, Yoshinori Takao, Koji Eriguchi, and Kouichi Ono
Published August 22, 2011 (5 pages)
[Abstract] [Full Text PDF (842K)]

08KD06 : Effect of Low Growth Rate in Chemical Beam Epitaxy on Carrier Mobility and Lifetime of p-GaAsN Films

Takahiko Honda, Kazuma Ikeda, Makoto Inagaki, Hidetoshi Suzuki, Nobuaki Kojima, Yoshio Ohshita, and Masafumi Yamaguchi
Published August 22, 2011 (4 pages)
[Abstract] [Full Text PDF (502K)]

Thin film/nanostructure formation

08KE01 : SiN_x Double Layer Antireflection Coating by Plasma-Enhanced Chemical Vapor Deposition for Single Crystalline Silicon Solar Cells

Daeyeong Gong, Youn-Jung Lee, Minkyu Ju, Jisoo Ko, Doohwan Yang, Yongwoo Lee, Gyuho Choi, Sin Kim, Jinsu Yoo, Byoungdeog Choi, and Junsin Yi
Published August 22, 2011 (5 pages)
[Abstract] [Full Text PDF (707K)]

08KE02 : Preparation of SiO₂ Passivation Thin Film for Improved the Organic Light-Emitting Device Life Time

Jeong Soo Hong, Sang Mo Kim, and Kyung-Hwan Kim
Published August 22, 2011 (5 pages)
[Abstract] [Full Text PDF (881K)]

08KE03 : Reactive Sputter Deposition of SiO_xN_y Films under Ar–CO₂–N₂ Atmosphere

Toru Ashida, Hideo Omoto, Takao Tomioka, and Atsushi Takamatsu
Published August 22, 2011 (4 pages)
[Abstract] [Full Text PDF (537K)]

08KE04 : Enhancement in Electron Field Emission of Microcrystalline Diamond Films upon Iron Coating and Annealing Processes

Pin-Chang Huang, Wen-Ching Shih, Huang-Chin Chen, and I-Nan Lin
Published August 22, 2011 (5 pages)
[Abstract] [Full Text PDF (1060K)]

08KE05 : Magnetron Sputtering Deposition of Conductive Diamond-Like Carbon Films with Embedded Nanoparticles

Koichi Sasaki, Takahiko Tsutsumi, and Noriharu Takada
Published August 22, 2011 (4 pages)
[Abstract] [Full Text PDF (735K)]

08KE06 : Formation of High-Density Pt Nanodots on SiO₂ Induced by Millisecond Rapid Thermal Annealing Using Thermal Plasma Jet for Floating Gate Memory

Katsunori Makihara, Kazuya Matsumoto, Masato Yamane, Tatsuya Okada, Naoya Morisawa, Mitsuhisa Ikeda, Seiichiro Higashi, and Seiichi Miyazaki
Published August 22, 2011 (4 pages)
[Abstract] [Full Text PDF (544K)]

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