Jpn. J. Appl. Phys. 12 (1973) pp. 1635-1636  |Next Article|  |Table of Contents|
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Short Note

An Investigation of Stability of p-Channel Ion-Implanted MOS Transistors by BT Treatments

Kunio Nakamura and Mototaka Kamoshida

(Received January 19, 1973; revised June 4, 1973)

URL: http://jjap.jsap.jp/link?JJAP/12/1635/
DOI: 10.1143/JJAP.12.1635

References

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3. H. G. Dill, T. N. Toombs and L.-O. Bauer: Proc. 2nd Intern. Conf. Ion Implantation in Semiconductors eds. I. Ruge and J. Graul. (Springer-Verlag, Berlin 1971) p. 315.
4. P. J. Coppen, K. G. Aubuchon, L.-O. Bauer and N. E. Moyer: Solid-State Electron. 15 (1972) 165.
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