Jpn. J. Appl. Phys. 13 (1974) pp. 361-362 |Next Article| |Table of Contents|
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Short Note
Diffusion Profiles of Arsenic in Silicon Observed by Backscattering Method and by Electrical Measurement
Shinji Ohkawa,
Yoshio Nakajima,
Teruo Sakurai,
Hidetoshi Nishi and
Yukio Fukukawa
Fujitsu Laboratories Ltd.
(Received June 13, 1973)
URL:
http://jjap.jsap.jp/link?JJAP/13/361/
DOI: 10.1143/JJAP.13.361
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