Jpn. J. Appl. Phys. 14 (1975) pp. 1665-1672  |Next Article|  |Table of Contents|
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Phosphorus Diffusion in Silicon Free from the Surface Effect under Extrinie Conditions

Satoru Matsumoto, Eisuke Arai¹, Hiroaki Nakamura¹ and Tatsuya Niimi

(Received May 15, 1975)

The behaviour of the diffusion coefficient of phosphorus in silicon free from the surface effect under extrinsic conditions has been studied. Diffusions are carried out at 900°C and 1100°C from the source of a thin layer of high concentration of phosphorus (∼5×10¹⁹ cm^-3) inbedded in the interior of silicon. Diffusion coefficients, which are determined by a computer simulation,are larger than the intrinsic diffusion coefficient obtained by Ghoshtagore even in the low con-centration range of the impurity. The magnitude of the diffusion coefficients depends on the concentration of the impurity both at the interface and at the point in the bulk where they are determined. The former dependence is strong, being affected by the generation of the excessvacancy, while the latter is weak and is manifested by the built-in field effect.

URL: http://jjap.jsap.jp/link?JJAP/14/1665/
DOI: 10.1143/JJAP.14.1665

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