Jpn. J. Appl. Phys. 18 (1979) pp. 201-202  |Next Article|  |Table of Contents|
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Short Note

Discharges in a Magnetron-Type Cold Cathode Ion Gun for the Sputter Etching Apparatus

Kentaro Yoshida and Takashi Yamada

Faculty of Engineering, Kobe University

(Received July 10, 1978)

URL: http://jjap.jsap.jp/link?JJAP/18/201/
DOI: 10.1143/JJAP.18.201


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References | Citing Articles (2)

  1. K. Yoshida, R. Konishi and S. Nagata: J. Electron Microsc. 22 (1973) 5.
  2. M. S. Abrahams, C. J. Buiocchi and M. D. Coutts: Rev. Sci. Instrum. 39 (1968) 1944[AIP Scitation].
  3. N. J. Tighe and B. J. Hockey: Rec. 10th Symp. Electron, Ion Laser Beam Technol. (IEEE, San Francisco Press, 1969) p. 375.
  4. A. H. Heuer, R. F. Firestone, J. D. Snow, H. W. Green, R. G. Howe and J. M. Christie: Rev. Sci. Instrum. 42 (1971) 1177[AIP Scitation].
  5. N. A. Kervalishivili, V. P. Kortkhondzhiya: Zh. Tekh. Fiz. 45 (1975) 2557.

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