Jpn. J. Appl. Phys. 20 (1981) pp. 519-526  |Next Article|  |Table of Contents|
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High-Energy Neutral Atoms in the Sputtering of ZnO

Kikuo Tominaga, Nozomu Ueshiba, Yoshihiro Shintani and Osamu Tada

(Received August 4, 1980; accepted for publication December 20, 1980)

Dips were observed in the distribution curves of the deposition rates of ZnO films prepared both by planar diode and by planar magnetron sputtering. These dips are ascribed to high-energy neutral atoms bombarding the films. The influence of high-energy neutral atoms on the mixed orientation of ZnO film is also investigated in planar diode sputtering. In planar magnetron sputtering, which gives highly [00·2] oriented ZnO films, the correlation between the degree of c-axis orientation and the flux of high-energy neutral atoms is examined. It is found that high-energy neutral atoms should be considered when trying to obtain highly-oriented ZnO films.

URL: http://jjap.jsap.jp/link?JJAP/20/519/
DOI: 10.1143/JJAP.20.519

References | Citing Articles (34)

1. G. A. Rozgonyi and W. J. Polito: J. Appl. Phys. 39 (1968) 5215[AIP Scitation].
2. D. L. Raimondi and E. Kay: J. Vac. Sci. & Technol. 7 (1970) 96[AIP Scitation].
3. F. S. Hickernell: Proc. IEEE 64 (1976) 631.
4. B. T. Khuri-Yakub, G. S. Kino and P. Galle: J. Appl. Phys. 46 (1975) 3266[AIP Scitation].
5. S. Maniv and A. Zangvil: J. Appl. Phys. 49 (1978) 2787[AIP Scitation].
6. K. Ohji, T. Thoda, K. Wasa and S. Hayakawa: J. Appl. Phys. 47 (1976) 1726[AIP Scitation].
7. M. Minakata, N. Chubachi and Y. Kikuchi: Jpn. J. Appl. Phys. 11 (1972) 1852[JSAP].
8. M. Minakata, N. Chubachi and Y. Kikuchi: Jpn. J. Appl. Phys. 12 (1973) 474[JSAP].
9. T. Shiosaki, M. Ooishi, T. Ohnishi and A. Kawabata: Proc. 1st Meeting on Ferroelectric Materials & Their Applications, Kyoto, 1977 (The 1st Meeting of FMA, Kyoto, 1977) p. 43.
10. Y. Shintani, K. Nakanishi, T. Takawaki and O. Tada: Jpn. J. Appl. Phys. 14 (1975) 1875[JSAP].
11. I. Brodie, L. T. Lamont, Jr. and R. L. Jepsen: Phys. Rev. Lett. 21 (1968) 1224[APS].
12. H. F. Winters and E. Kay: J. Appl. Phys. 38 (1967) 3928[AIP Scitation].
13. F. W. Aston: Proc. R. Soc. London A 79 (1907) 80.
14. P. Sigmund: Phys. Rev. 184 (1969) 383[APS].
15. M. W. Thompson: Philos. Mag. 18 (1968) 377.
16. K. Koichi, K. Honjou, K. Koga and K. Toki: Jpn. J. Appl. Phys. 12 (1973) 1297[JSAP].
17. K. Kadota and Y. Kaneko: Jpn. J. Appl. Phys. 13 (1974) 1554[JSAP].