Jpn. J. Appl. Phys. 21 (1982) pp. 688-695
|Table of Contents|
|Abstract| |Full Text PDF (1511K)| |Buy This Article|
Energy Analysis of High-Energy Neutral Atoms in the Sputtering of ZnO and BaTiO3
Kikuo Tominaga, Satoshi Iwamura, Yoshihiro Shintani and Osamu Tada
Articles citing this article
The list of citing articles is based on data provided by CrossRef Cited-by Linking. Any errors or omissions are the responsibility of the primary publisher.
-
Journal of Materials Research 27 (2012) 765
- Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment
-
- Klaus Ellmer and Thomas Welzel
-
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (2012) 061306
- Negative oxygen ion formation in reactive magnetron sputtering processes for transparent conductive oxides
-
- Thomas Welzel and Klaus Ellmer
-
Applied Physics Express 4 (2011) 045801
- Enhanced Carrier Transport in Uniaxially (001)-Oriented Anatase Ti0.94Nb0.06O2 Films Grown on Nanosheet Seed Layers
-
- Naoomi Yamada, Tatsuo Shibata, Kenji Taira, Yasushi Hirose, Toshihiro Shimada, Takayoshi Sasaki, Tetsuya Hasegawa, Shoichiro Nakao, Ngoc Lam Huong Hoang, and Taro Hitosugi
-
Semiconductor Science and Technology 26 (2011) 105022
- The mechanisms of negative oxygen ion formation from Al-doped ZnO target and the improvements in electrical and optical properties of thin films using off-axis dc magnetron sputtering at low temperature
-
- Huu Chi Nguyen, Thanh Thuy Trinh, Tran Le, Cao Vinh Tran, Tuan Tran, Hyeongsik Park, Vinh Ai Dao, and Junsin Yi
-
Journal of Physics D Applied Physics 43 (2010) 405303
- The role of energetic ion bombardment during growth of TiO2 thin films by reactive sputtering
-
- A Amin, D Köhl, and M Wuttig
-
Journal of The Electrochemical Society 157 (2010) H891
- ZnO Doping and Co-doping Paradigm and Properties
-
- K. Shtereva, I. Novotny, V. Tvarozek, P. Sutta, A Vincze, and A. Pullmannova
-
Journal of Applied Physics 106 (2009) 054908
- Scaling of surface roughness in sputter-deposited ZnO:Al thin films
-
- Bhaskar Chandra Mohanty, Hong-Rak Choi, and Yong Soo Cho
-
Journal of Electroceramics 23 (2009) 356
- Electrical and optical studies of transparent conducting ZnO:Al thin films by magnetron dc sputtering
-
- Vinh Ai Dao, Tran Le, Tuan Tran, Huu Chi Nguyen, Kyunghae Kim, Jaehyeong Lee, Sungwook Jung, N. Lakshminarayan, and Junsin Yi
-
Journal of Applied Physics 104 (2008) 043510
- Investigations on multimagnetron sputtered Zn1−xMgxO thin films through metal-ferroelectric-semiconductor configuration
-
- Dhananjay, J. Nagaraju, and S. B. Krupanidh
-
Journal of Applied Physics 103 (2008) 083306
- Tailoring of structure formation and phase composition in reactively sputtered zirconium oxide films using nitrogen as an additional reactive gas
-
- D. Severin, K. Sarakinos, O. Kappertz, A. Pflug, and M. Wuttig
-
Journal of Applied Physics 102 (2007) 074512
- A comparison of zinc oxide thin-film transistors on silicon oxide and silicon nitride gate dielectrics
-
- P. F. Carcia, R. S. McLean, M. H. Reilly, M. K Crawford, E. N. Blanchard, A. Z. Kattamis, and S. Wagner
-
Journal of Applied Physics 101 (2007) 123717
- Low threshold voltage ZnO thin film transistor with a Zn0.7Mg0.3O gate dielectric for transparent electronics
-
- Dhananjay and S. B. Krupanidhi
-
Thin Solid Films 515 (2007) 3554
- The effect of target aging on the structure formation of zinc oxide during reactive sputtering
-
- D. Severin, O. Kappertz, T. Nyberg, S. Berg, and M. Wuttig
-
Japanese Journal of Applied Physics 45 (2006) L1179
- Effects of Postdeposition Annealing on Electrical Properties of Mo-Doped Indium Oxide (IMO) Thin Films Deposited by RF Magnetron Cosputtering
-
- Naoomi Yamada, Tsukasa Tatejima, Hiroki Ishizaki and Tokio Nakada
-
Journal of Applied Physics 100 (2006) 033305
- Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar∕O2 mixtures
-
- Jon M. Andersson, E. Wallin, E. P. Mu?nger, and U. Helmersson
-
Vacuum 80 (2006) 654
- Energetic negative ions in titanium oxide deposition by reactive sputtering in Ar/O2
-
- Kikuo Tominaga, Daisuke Ito, and Yoshinori Miyamoto
-
Journal of the Society for Information Display 13 (2005) 547
- Oxide engineering of ZnO thin-film transistors for flexible electronics
-
- P. F. Carcia, R. S. McLean, and M. H. Reilly
-
Applied Physics Letters 82 (2003) 1117
- Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering
-
- P. F. Carcia, R. S. McLean, M. H. Reilly, and G. Nunes
-
International Journal of Mass Spectrometry 223-224 (2003) 679
- Interpretation of ion distribution functions measured by a combined energy and mass analyzer
-
- K Ellmer, R Wendt, and K Wiesemann
-
Japanese Journal of Applied Physics 41 (2002) 6174
- Crystallinity of Gallium-Doped Zinc Oxide Films Deposited by DC Magnetron Sputtering Using Ar, Ne or Kr Gas
-
- Masato Kon, Pung Keun Song, Akira Mitsui and Yuzo Shigesato
-
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 20 (2002) 356
- Effect of O2 gas partial pressure on mechanical properties of SiO2 films deposited by radio frequency magnetron sputtering
-
- H. Fujiyama, T. Sumomogi, and T. Endo
-
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 19 (2001) 1582
- Energetic oxygen ions in the reactive sputtering of the Zr target in Ar+O2 atmosphere
-
- Kikuo Tominaga and Takuya Kikuma
-
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 19 (2001) 2382
- Dependence of compositions and crystallization behaviors of dc-sputtered TiNi thin films on the deposition conditions
-
- Jyh-Ming Ting and Peter Chen
-
Thin Solid Films 398-399 (2001) 597
- Characteristics of TiNi alloy thin films
-
- Peter Chen and Jyh-Ming Ting
-
Japanese Journal of Applied Physics 38 (1999) 2921
- Electrical and Structural Properties of Tin-Doped Indium Oxide Films Deposited by DC Sputtering at Room Temperature
-
- Pung Keun Song, Yuzo Shigesato, Masayuki Kamei and Itaru Yasui
-
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 17 (1999) 3003
- Effects of grid bias on ZnO/α-Al2O3(0001) heteroepitaxy
-
- S. J. Doh, S. I. Park, T. S. Cho, and Jung Ho Je
-
Thin Solid Films 343-344 (1999) 81
- Energetic oxygen particles in the reactive sputtering of Zn targets in Ar/O2 atmospheres
-
- K. Tominaga, T. Murayama, Y. Sato, and I. Mori
-
Surface and Coatings Technology 94-95 (1997) 179
- Phase formation and mechanical properties of alumina coatings prepared at substrate temperatures less than 500 °C by ionized and conventional sputtering
-
- M. Schneider Jochen, D. Sproul William, and Matthews Allan
-
Thin Solid Films 293 (1997) 67
- Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target
-
- Henryk Tomaszewski, Johan Haemers, Nico De Roo, Jurgen Denul, and Roger De Gryse
-
Japanese Journal of Applied Physics 35 (1996) 4972
- Gas Pressure Dependence of AlN Film Properties in Alternating Sputtering System
-
- Kikuo Tominaga, Takahiro Ao, Ichiro Mori, Kazuya Kusaka and Takao Hanabusa
-
Thin Solid Films 266 (1995) 145
- On the homogeneity of sputter-deposited ITO films Part I. Stress and microstructure
-
- T.J. Vink, W. Walrave, J.L.C. Daams, P.C. Baarslag, and J.E.A.M. van den Meerakker
-
Japanese Journal of Applied Physics 32 (1993) 4745
- Simultaneous Measurements of Energetic O- Ions and O Atoms in Sputtering of Zinc Oxide Target
-
- Kikuo Tominaga, Yasuhiko Sueyoshi, Hiroshi Imai, Munfei Chong and Yoshihiro Shintani
-
Japanese Journal of Applied Physics 32 (1993) 4131
- Energetic O- Ions and O Atoms in Planar Magnetron Sputtering of ZnO Target
-
- Kikuo Tominaga, Yasuhiko Sueyoshi, Chong Munfei and Yoshihiro Shintani
-
Journal of Materials Research 8 (1993) 1928
- Macro-effects of resputtering due to negative ion bombardment of growing thin films
-
- Daniel J. Kester and Russell Messier
-
Journal of Nuclear Materials 200 (1993) 375
- Influence of low-energy bombardment of an RF magnetron sputtering discharge on texture formation and stress in ZnO films
-
- R. Kaltofen and G. Weise
-
Japanese Journal of Applied Physics 31 (1992) 1868
- Damage in ZnO Film Preparation by Planar Magnetron Sputtering System with Obliquely Facing Targets of Zn
-
- Kikuo Tominaga, Yasuhiko Sueyoshi, Masaki Shirai and Hiroshi Imai
-
Japanese Journal of Applied Physics 31 (1992) 3009
- Influence of Energetic Particles on ZnO Films in the Preparation by Planar Magnetron Sputtering with Obliquely Facing Targets
-
- Kikuo Tominaga, Yasuhiko Sueyoshi, Hiroshi Imai and Masaki Shirai
-
Journal of Applied Physics 71 (1992) 3356
- Electrical and structural properties of low resistivity tin-doped indium oxide films
-
- Yuzo Shigesato, Satoru Takaki, and Takeshi Haranoh
-
Surface and Coatings Technology 54-55 (1992) 143
- Planar magnetron-sputtering system with obliquely facing targets
-
- Kikuo Tominaga, Hiroshi Imai, Yasuhiko Sueyoshi, and Masaki Shirai
-
Journal of Applied Physics 70 (1991) 6743
- Energy distribution of negative O− and OH− ions emitted from YBaCuO and iron garnet targets by dc and rf magnetron sputtering
-
- Jens-Peter Krumme, Ron A. A. Hack, and Ivo J. M. M. Raaijmakers
-
Journal of Applied Physics 70 (1991) 7089
- An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O2/Ar ratio, in Ti-O2 reactive sputtering processes
-
- Eiji Kusano
-
Journal of Applied Physics 69 (1991) 390
- Resputtering effects on the stoichiometry of YBa2Cu3Ox thin films
-
- T. I. Selinder, G. Larsson, U. Helmersson, and S. Rudner
-
Superconductor Science and Technology 4 (1991) S379
-
- T I Selinder, G Larsson, U Helmersson, and S Rudner
-
Thin Solid Films 176 (1989) 227
- The influence of structure on the piezoelectric properties of BaTiO3 and (BaSr)TiO3 thin films with a diffuse phase transition
-
- Z. Surowiak, A.M. Margolin, I.N. Zakharchenko, and S.V. Biryukov
-
Japanese Journal of Applied Physics 27 (1988) 2414
- Time-of-Flight Measurement of Particles in SiO2 Sputtering
-
- Kikuo Tominaga, Michiya Kume and Osamu Tada
-
Japanese Journal of Applied Physics 27 (1988) 1176
- Radiation Effect due to Energetic Oxygen Atoms on Conductive Al-Doped ZnO Films
-
- Kikuo Tominaga, Kenji Kuroda and Osamu Tada
-
Journal of Applied Physics 64 (1988) 5117
- Optical properties of sputter-deposited ZnO:Al thin films
-
- Z.-C. Jin, I. Hamberg, and C. G. Granqvist
-
Thin Solid Films 136 (1986) 135
- Conductivity imaging of the erosion pattern for ZnO prepared by planar R.F. magnetron sputtering
-
- James B. Webb
-
Japanese Journal of Applied Physics 24 (1985) 35
- Energy Distribution of Energetic Oxygen Atoms in the Sputtering of ZnO
-
- Kikuo Tominaga, Michiya Kume, Takayuki Yuasa and Osamu Tada
-
Japanese Journal of Applied Physics 24 (1985) 944
- Influence of Energetic Oxygen Bombardment on Conductive ZnO Films
-
- Kikuo Tominaga, Takayuki Yuasa, Michiya Kume and Osamu Tada
-
Japanese Journal of Applied Physics 23 (1984) 1640
- Production of Atomic-Oxygen Negative-Ion Beam by Positive Ion-Induced Sputtering of Semiconductive BaTiO3 Ceramic
-
- Kaoru Ohya, Keiji Ishida and Ichiro Mori
-
Japanese Journal of Applied Physics 23 (1984) 936
- Mean Free Path of Energetic Oxygen Atoms in the Sputtering of ZnO
-
- Kikuo Tominaga, Takayuki Yuasa, Michiya Kume and Osamu Tada
-
Journal of Applied Physics 56 (1984) 3308
- Position and pressure effects in rf magnetron reactive sputter deposition of piezoelectric zinc oxide
-
- S. B. Krupanidhi and M. Sayer
-
Thin Solid Films 120 (1984) 55
- Highly oriented ZnO films obtained by d.c. reactive sputtering of a zinc target
-
- I. Petrov, V. Orlinov, and A. Misiuk
-
Japanese Journal of Applied Physics 22 (1983) 418
- High-Energy Particles in AlN Film Preparation by Reactive Sputtering Technique
-
- Kikuo Tominaga, Satoshi Iwamura, Yoshihiro Shintani and Osamu Tada