Jpn. J. Appl. Phys. 22 (1983) pp. 709-711 |Next Article| |Table of Contents|
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Sheath Potential Generated by a Relativistic Electron Beam
Institute of Plasma Physics, Nagoya University
1Department of Electrical Engineering, University of Tokyo
(Received October 21, 1982; accepted for publication January 22, 1983)
It is reported that a new sheath structure is formed in a plasma where a relativistic electron beam is injected. An application of this new sheath to the pinched-plasma ion beam source is described in order to avoid the electron bombardment on the electrode.
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