Jpn. J. Appl. Phys. 22 (1983) pp. 709-711  |Next Article|  |Table of Contents|
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Sheath Potential Generated by a Relativistic Electron Beam

Kazunari Ikuta and Isao Ueno¹

(Received October 21, 1982; accepted for publication January 22, 1983)

It is reported that a new sheath structure is formed in a plasma where a relativistic electron beam is injected. An application of this new sheath to the pinched-plasma ion beam source is described in order to avoid the electron bombardment on the electrode.

URL: http://jjap.jsap.jp/link?JJAP/22/709/
DOI: 10.1143/JJAP.22.709

References

1. K. Ikuta: Jpn. J. Appl. Phys. 21 (1982) 125[JSAP].
2. For example, J. A. Pasour, R. A. Mahaffey, J. Golden and C. A. Kapetanakos: Appl. Phys. Lett. 36 (1980) 646[AIP Scitation].
3. O. Bunemann: Phys. Rev. 115 (1959) 503[APS].