Jpn. J. Appl. Phys. 24 (1985) pp. L781-L784  |Next Article|  |Table of Contents|
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Letter

Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Tadatsugu Minami, Hirotoshi Sato, Hidehito Nanto and Shinzo Takata

Electron Device System Laboratory, Kanazawa Institute of Technology

(Received July 8, 1985; accepted for publication September 28, 1985)

The detailed study of electrical properties in group III impurity doped ZnO thin films prepared by rf magnetron sputtering is described. The resistivity is lowered by doping of B, Al, Ga and In into ZnO films. The characteristic features of ZnO films doped with group III elements except for B are their high carrier concentration and low mobility. Variation of the mobility with the impurity content is roughly governed by the ionized impurity scattering. It is shown that the doped ZnO films exhibit the resistivity dependence on film thickness below 300 nm.

URL: http://jjap.jsap.jp/link?JJAP/24/L781/
DOI: 10.1143/JJAP.24.L781


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References | Citing Articles (245)

  1. J. Aranovich, A. Ortiz and R. H. Bube: J. Vac. Sci. Technol. 16 (1979) 930[AIP Scitation].
  2. A. P. Roth and D. F. Williams: J. Electrochem. Soc. 128 (1981) 2684.
  3. P. S. Nayer and A. Catalano: Appl. Phys. Lett. 39 (1981) 105[AIP Scitation].
  4. J. B. Webb, D. F. Williams and M. Buchanan: Appl. Phys. Lett. 39 (1981) 930[AIP Scitation].
  5. O. Caporaletti: Solar Energy Materials 7 (1982) 65.
  6. K. Ito and T. Nakazawa: Jpn. J. Appl. Phys. 22 (1983) L245[JSAP].
  7. D. E. Brodie, R. Singh, J. H. Morgan, J. D. Leslie, L. J. Moore and A. E. Dixon: Proc. 14th IEEE Photovoltaic Specialist Conf., San Diego 1980 (IEEE, New York, 1980) p. 468.
  8. T. Minami, H. Nanto and S. Takata: Appl. Phys. Lett. 41 (1982) 958[AIP Scitation].
  9. T. Minami, H. Nanto, S. Shooji and S. Takata: Thin Solid Films 111 (1984) 167[CrossRef].
  10. G. Bogner and E. Mollow: J. Phys. Chem. Solids 6 (1958) 136.
  11. T. Hada, K. Wasa and S. Hayakawa: Thin Solid Films 7 (1971) 135[CrossRef].
  12. S. Major, A. Banarzee and K. L. Chopra: Thin Solid Films 108 (1983) 333[CrossRef].
  13. T. Minami, H. Nanto and S. Takata: Jpn. J. Appl. Phys. 23 (1984) L280[JSAP].
  14. T. Minami, H. Nanto and S. Takata: Thin Solid Films 24 (1985) 43.
  15. T. Minami, H. Nanto and S. Takata: Jpn. J. Appl. Phys. 24 (1985) L605[JSAP].
  16. H. Nanto, T. Minami, S. Shooji and S. Takata: J. Appl. Phys. 55 (1984) 1029[AIP Scitation].

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