Jpn. J. Appl. Phys. 25 (1986) pp. 1132-1133  |Next Article|  |Table of Contents|
|Full Text PDF (391K)| |Buy This Article|

Short Note

Fabrication of NbN/Pb(In) Josephson Junctions with High Resistive Normal Layer Produced by Ar+ Ion Bombardment

Yukinori Saito and Shinji Suganomata

Department of Electrical Engineering, Yamanashi University

(Received April 16, 1986; accepted for publication May 24, 1986)

NbN/normal layer/Pb(In) Josephson junctions were fabricated by Ar+-ion bombardment. A thin normal layer of the order of ∼7 nm with a very high resistivity was produced in the near surface of an NbN film. This type S-N-S junction showed well-defined constant-voltage steps up to about 500 µV when microwave power was applied.

URL: http://jjap.jsap.jp/link?JJAP/25/1132/
DOI: 10.1143/JJAP.25.1132


|Full Text PDF (391K)| |Buy This Article| Citation:


References

  1. K. K. Likharev: Rev. Mod. Phys. 51 (1979) 101[APS].
  2. N. R. Werthamer: Phys. Rev. 132 (1963) 2440[APS].
  3. H. J. Fink, M. Sheikholeslam, A. Gilabert, J. P. Laheurte, J. P. Romagnan, J. C. Noiray: Phys. Rev. B 14 (1976) 1052[APS].
  4. Hartwig Schlüter, Herbert C. Freyhardt: J. Low. Temp. Phys. 59 (1985) 213.
  5. Yoichi Okabe, Motomu Takatsu: Jpn. J. Appl. Phys. 24 (1985) 1312[JSAP].
  6. O. Meyer, G. Linker, B. Kraeft: Thin Solid Films 19 (1973) 217.
  7. Ginichiro Oya, Yutaka Onodera: J. Appl. Phys. 45 (1974) 1389[AIP Scitation].
  8. P. D. Townsend, J. C. Kelly, N. E. W. Hartley: Ion Implantation, Sputtering and Their Applications (Academic Press, London, 1976).

|TOP|  |Next Article|  |Table of Contents| |JJAP Home|
Copyright © 2013 The Japan Society of Applied Physics
Contact Information