Jpn. J. Appl. Phys. 31 (1992) pp. 4301-4306  |Next Article|  |Table of Contents|
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Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

Takahiro Kozawa, Yoichi Yoshida, Mitsuru Uesaka and Seiichi Tagawa¹

(Received July 11, 1992; accepted for publication September 19, 1992)

The radiation-induced reactions of onium salts in some kinds of solutions and model compound solutions of chemically amplified electron beam (EB) and X-ray resists have been studied by means of picosecond and nanosecond pulse radiolysis. The following reaction mechanisms of the chemically amplified EB and X-ray resists have been elucidated. The radiation-induced reaction mechanisms are complicated due to the presence of several proton donors. The onium salts directly produce small amounts of Brønsted acids by EB and X-ray exposure and most of the Brønsted acids are formed from proton adducts of the base polymer. The onium salts are strong electron scavengers and promote the generation of the proton adducts in the chemically amplified resists.

URL: http://jjap.jsap.jp/link?JJAP/31/4301/
DOI: 10.1143/JJAP.31.4301

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