Jpn. J. Appl. Phys. 32 (1993) pp. L1562-L1564  |Next Article|  |Table of Contents|
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Scaling Analysis of Chemical-Vapor-Deposited Tungsten Films by Atomic Force Microscopy

Tatsuo Yoshinobu and Hiroshi Iwasaki

The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567

(Received June 28, 1993; accepted for publication September 18, 1993)

We have studied the static surface roughness of 500-nm-thick tungsten chemical-vapor-deposited polycrystalline films on length scales between 5 and 5×104 nm, using atomic force microscopy. The interface width scales as a power of the system size for small system sizes (<1000 nm) but is constant for large sizes, which is in agreement with nonequilibrium interface growth theory. The scaling exponent (0.75±0.05) for short-length scales appears to be consistent with the recent prediction based on a conservative volume growth model. In the long-range regime, the rms value becomes larger as the substrate temperature is lowered.

URL: http://jjap.jsap.jp/link?JJAP/32/L1562/
DOI: 10.1143/JJAP.32.L1562
KEYWORDS:interface roughness, nonequilibrium growth, scaling, self-affine, chemical vapor deposition, tungsten, atomic force microscopy, experiment


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