(Received June 2, 1992; accepted for publication December 19, 1992)
Visible photoluminescence from oxidized Si microcrystalline particles was observed under excitation of an He-Cd laser at room temperature. The particles had been prepared by mean of the SiH4 gas breakdown method with a Nd3+-YAG pulse laser. The particles formed a single-crystalline structure of Si. The photoluminescence spectrum obtained from these particles showed maximum intensity at a wavelength of 730 nm. This wavelength did not change with particle size. These Si particles exhibited visible photoluminescence when oxidized.
KEYWORDS:visible photoluminescence, Si microcrystalline particles, pure Si, Nd3+-YAG pulse laser, gas breakdown, size under-5 nm, oxidization