Jpn. J. Appl. Phys. 33 (1994) pp. 1823-1830  |Table of Contents|
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Novel Approach to Evaluation of Charging on Semiconductor Surface by Noncontact, Electrode-Free Capacitance/Voltage Measurement

Sadao Hirae, Motohiro Kohno, Hiroshi Okada, Hideaki Matsubara, Ikuyoshi Nakatani, Tatsufumi Kusuda and Takamasa Sakai

Articles citing this article

The list of citing articles is based on data provided by CrossRef Cited-by Linking. Any errors or omissions are the responsibility of the primary publisher.

  1. Japanese Journal of Applied Physics 42 (2003) 5837
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  2. Japanese Journal of Applied Physics 41 (2002) 2266
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    Motohiro Kohno, Toshikazu Kitajima, Hiroshi Okada, Sadao Hirae and Takamasa Sakai
  3. IEEE Transactions on Electron Devices 47 (2000) 2392
    Iron contamination in silicon wafers measured with the pulsed MOS capacitor generation lifetime technique
    M. Miyazaki, M. Kohno, D.K. Schroder, and Suat-Eng Tan
  4. Japanese Journal of Applied Physics 37 (1998) 5800
    Noncontact Measurement of Doping Profile for Bare Silicon
    Motohiro Kohno, Hideaki Matsubara, Hiroshi Okada, Sadao Hirae and Takamasa Sakai
  5. Japanese Journal of Applied Physics 35 (1996) 5539
    Noncontact Measurement of Generation Lifetime
    Motohiro Kohno, Sadao Hirae, Hiroshi Okada, Hideaki Matsubara, Ikuyoshi Nakatani, Yasuhiro Imaoka, Tatsufumi Kusuda and Takamasa Sakai


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