Jpn. J. Appl. Phys. 38 (1999) pp. 7114-7118  |Next Article|  |Table of Contents|
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A New Approach to Reducing Line-Edge Roughness by Using a Cross-Linked Positive-Tone Resist

Toru Yamaguchi, Hideo Namatsu, Masao Nagase, Kenji Yamazaki and Kenji Kurihara

NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

(Received July 9, 1999; accepted for publication October 4, 1999)

We propose a cross-linking technique as a new approach to reducing the line-edge roughness (LER) of resist patterns. In addition, we also develop a cross-linked positive-tone resist called the suppressed aggregate extraction development (SAGEX) resist, based on this technique. Our key approach to reducing the LER is the suppression of the aggregate extraction development, which causes LER. We demonstrate successful suppression of the aggregate extraction development by cross-linking polymers in the surrounding regions and by reducing the difference between dissolution rates inside and outside the aggregates, and clarify that the LER of the resist patterns in the SAGEX resist is reduced.

DOI: 10.1143/JJAP.38.7114
KEYWORDS:line-edge roughness, polymer aggregates, aggregate extraction development, positive-tone resist

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