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Jpn. J. Appl. Phys. 39 (2000) pp. 1371-1377  |Next Article|  |Table of Contents|
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Mechanism of Nitrogen Incorporation into Amorphous-CNx Films Formed by Plasma-Enhanced Chemical-Vapor Deposition of the Doublet and Quartet States of the CN Radical

Haruhiko Ito, Noriko Ito, Tsutomu Takahashi, Hirosuke Takamatsu, Daisuke Tanaka and Hidetoshi Saitoh

Department of Chemistry, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan

(Received September 30, 1999; accepted for publication December 6, 1999)

High-resolution CN(B2Σ+–X2Σ+) emission spectra were observed for the various processes to form amorphous-CNx (a-CNx) films using the plasma-enhanced chemical-vapor deposition of the CN radical produced from the dissociative excitation reactions of cyanides. A strong correlation was confirmed between the electronic states of CN in the plasma and the bonding states of nitrogen atoms in the films. The 4Σ+ and 4Π states of CN were the precursors of the one- and/or two-dimensional C=N and C–N network structures of the films with high nitrogen content, [N]/([N]+[C]) ≤0.5. The CN(X2Σ+) state formed the C≡N terminations primarily, a part of which changed to the one-dimensional C=N network from the additive reactions. The above correlation was fully explained by the molecular orbitals and the electronic configurations for the relevant electronic states of CN.

URL: http://jjap.jsap.jp/link?JJAP/39/1371/
DOI: 10.1143/JJAP.39.1371


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References | Citing Articles (29)

  1. J. H. Kaufman, S. Metin and D. D. Saperstein: Phys. Rev. B 39 (1989) 13053[APS].
  2. J. Hu, P. Yang and C. M. Lieber: Phys. Rev. B 57 (1998) R3185[APS].
  3. C. Ronning, H. Feldermann, R. Merk, H. Hofsaess, P. Reinke and J.-U. Thiele: Phys. Rev. B 58 (1998) 2207[APS].
  4. O. Amir and R. Kalish: J. Appl. Phys. 70 (1991) 4958[AIP Scitation].
  5. D. F. Franceschini, C. A. Achete and F. L. Freie Jr.: Appl. Phys. Lett. 60 (1992) 3229[AIP Scitation].
  6. F. L. Freire Jr.: Jpn. J. Appl. Phys. 36 (1997) 4886[JSAP].
  7. H. Saitoh, T. Inoue and S. Ohshio: Jpn. J. Appl. Phys. 37 (1998) 4983[JSAP].
  8. S. F. Durrant, E. C. Rangel and M. A. Bica de Moraes: J. Vac. Sci. & Technol. A 13 (1995) 1901[AIP Scitation].
  9. S. F. Durrant and M. A. Bica de Moraes: J. Polymer Sci. B 36 (1998) 1881.
  10. C. Vivien, J. Hermann, A. Perrone, C. Boulmer-Leborgne and A. Luches: J. Phys. D 31 (1998) 1263[IoP STACKS].
  11. G. Dinescu, E. Aldea, M. L. De Giorgi, A. Luches, A. Perrone and A. Zocco: Appl. Surf. Sci. 127–129 (1998) 697[CrossRef].
  12. F. Kokai, K. Yamamoto, Y. Koga, S. Fujiwara and R. B. Heimann: Appl. Phys. A 66 (1998) 403.
  13. D. J. Benard, C. Linnen, A. Harker, H. H. Michels, J. B. Addison and R. Ondercin: J. Phys. Chem. B 102 (1998) 6010.
  14. H. Saitoh, H. Takamatsu, D. Tanaka, N. Ito, S. Ohshio and H. Ito: to be published in Jpn. J. Appl. Phys.
  15. W. H. Duewer, J. A. Coxon and D. W. Setser: J. Chem. Phys. 56 (1972) 4355[AIP Scitation].
  16. J. A. Coxon, D. W. Setser and W. H. Duewer: J. Chem. Phys. 58 (1973) 2244[AIP Scitation].
  17. T. Urisu and K. Kuchitsu: J. Photochem. 2 (1973/74) 409.
  18. J. A. Coxon, D. A. Ramsay and D. W. Setser: Can. J. Phys. 53 (1975) 145.
  19. T. A. Miller, R. S. Freund and R. W. Field: J. Chem. Phys. 65 (1976) 3790[AIP Scitation].
  20. J. M. Cook, B. R. Zegarski and T. A. Miller: J. Chem. Phys. 68 (1978) 4763[AIP Scitation].
  21. J. M. Cook, B. R. Zegarski and T. A. Miller: J. Chem. Phys. 70 (1979) 3739[AIP Scitation].
  22. A. J. Yencha, Y. Ozaki, T. Kondow and K. Kuchitsu: Chem. Phys. 51 (1980) 343.
  23. Y. Ozaki, T. Nagata, K. Suzuki, T. Kondow and K. Kuchitsu: Chem. Phys. 80 (1983) 73.
  24. Y. Ozaki, H. Ito, K. Suzuki, T. Kondow and K. Kuchitsu: Chem. Phys. 80 (1983) 85.
  25. H. Ito, Y. Ozaki, T. Nagata, T. Kondow and K. Kuchitsu: Can. J. Phys. 62 (1984) 1586.
  26. K. Kanda, H. Ito, K. Someda, K. Suzuki, T. Kondow and K. Kuchitsu: J. Phys. Chem. 93 (1989) 6020[CrossRef].
  27. K. Kanda, H. Ito, K. Suzuki, T. Kondow and K. Kuchitsu: Chem. Phys. Lett. 185 (1991) 225[CrossRef].
  28. K. Kanda, H. Ito, K. Suzuki, T. Kondow and K. Kuchitsu: Bull. Chem. Soc. Jpn. 65 (1992) 481.
  29. H. Ito, Y. Ozaki, K. Suzuki, T. Kondow and K. Kuchitsu: J. Chem. Phys. 96 (1992) 4195[AIP Scitation].
  30. H. Ito, A. Kazama and K. Kuchitsu: J. Mol. Struct. 324 (1994) 29.
  31. T. Nagata, T. Kondow and K. Kuchitsu: Chem. Phys. Lett. 95 (1983) 97[CrossRef].
  32. W. M. Jackson: J. Chem. Phys. 61 (1974) 4177[AIP Scitation].
  33. M. Jeunehomme: J. Chem. Phys. 42 (1965) 4086[AIP Scitation].
  34. C. Conley, J. B. Halpern, J. Wood, C. Vaughn and W. M. Jackson: Chem. Phys. Lett. 73 (1980) 224.
  35. K. Suzuki and K. Kuchitsu: Bull. Chem. Soc. Jpn. 50 (1977) 1449.
  36. M. Zhang, Y. Nakayama, T. Miyazaki and M. Kume: J. Appl. Phys. 85 (1999) 2904[AIP Scitation].
  37. M. R. Gorbal and M. I. Savadatti: Chem. Rev. 82 (1982) 527.
  38. N. Mutsukura, S. Inoue and Y. Mach: J. Appl. Phys. 72 (1992) 43[AIP Scitation].
  39. D. J. Dagel, C. M. Mallouris and J. R. Doyle: J. Appl. Phys. 79 (1996) 8735[AIP Scitation].
  40. H. F. Schaefer, III and T. G. Heil: J. Chem. Phys. 54 (1971) 2573[AIP Scitation].
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