Jpn. J. Appl. Phys. 40 (2001) pp. 110-111  |Next Article|  |Table of Contents|
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Short Note

Spatial Inhomogeneity of Photoluminescence in an InGaN-Based Light-Emitting Diode Structure Probed by Near-Field optical Microscopy Under Illumination-Collection Mode

Akio Kaneta1, Tomoaki Izumi1, Koichi Okamoto1, Yoichi Kawakami1, Shigeo Fujita1, Yoshihito Narita2, Tsutomu Inoue2 and Takashi Mukai3

1Department of Electronic Science and Engineering, Kyoto University, Kyoto 606-8501, Japan
2Spectroscopic Division, JASCO Corporation, 2967-5 Ishikawa-cho, Hachioji, Tokyo 192-8537, Japan
3Department of Research and Development, Nichia Chemical Industries Ltd., 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan

(Received July 21, 2000; accepted for publication September 25, 2000)

Spatial distribution of photoluminescence (PL) spectra has been assessed in an InGaN single quantum well (SQW)-based light-emitting diode structure by near-field optical microscopy under the illumination-collection mode. The obtained PL mapping image revealed a variation in both peak and intensity of PL spectra according to the probing location with a scale less than about 200 nm. The variation in PL intensity is from 0.8 to 1.8 in arbitrary units indicating that the internal quantum efficiency fluctuates from 10% to 50% within the active layer.

URL: http://jjap.jsap.jp/link?JJAP/40/110/
DOI: 10.1143/JJAP.40.110
KEYWORDS:InGaN, SNOM, illumination-collection mode, PL mapping image, spatial inhomogeneity


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