Jpn. J. Appl. Phys. 40 (2001) pp. 3075-3081  |Next Article|  |Table of Contents|
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Wavelength Dependence of InGaN Laser Diode Characteristics

Shin-ichi Nagahama, Tomoya Yanamoto, Masahiko Sano and Takashi Mukai

Nitride Semiconductor Research Laboratory, Nichia Chemical Industries, Ltd., 491 Oka, Kaminaka, Anan, Tokushima 774, Japan

(Received December 7, 2000; accepted for publication February 5, 2001)

InGaN multi-quantum-well-structure laser diodes (LDs) with an emission wavelength of longer than 420 nm were grown on both an epitaxially laterally overgrown GaN (ELOG) substrate and an ELOG on a free-standing GaN substrate by a metaorganic chemical vapor deposition method. The wavelength dependence of InGaN LD characteristics was investigated. It was found that there was a strong relationship between the threshold current density and the emission wavelength of LDs. The LDs with the emission wavelength of 450 nm grown on the ELOG on a free-standing GaN substrate were demonstrated. The threshold current density and voltage of these LDs were 2.8 kA/cm2 and 4.5 V, respectively. The estimated lifetime was approximately 5000 h under 50°C continuous-wave operation at an output power of 5 mW.

URL: http://jjap.jsap.jp/link?JJAP/40/3075/
DOI: 10.1143/JJAP.40.3075


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