Jpn. J. Appl. Phys. 40 (2001) pp. 371-375  |Table of Contents|
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Monitoring of Si Molecular-Beam Epitaxial Growth by an Ellipsometric Method

Yoshifumi Yoshioka, Tetsuya Ikuta, Toshiya Taji, Kouzou Mizobata, Takayoshi Shimura and Masataka Umeno

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