Jpn. J. Appl. Phys. 40 (2001) pp. L383-L385 |Next Article| |Table of Contents|
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Letter
Propagation Characteristics of Ultrahigh-Δ Optical Waveguide on Silicon-on-Insulator Substrate
Atsushi Sakai,
Go Hara and
Toshihiko Baba
Division of Electrical and Computer Engineering, Yokohama National University,
79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
(Received January 22, 2001; accepted for publication February 19, 2001)
A submicron rectangular waveguide with a relative refractive index difference Δ of 45% was fabricated on a silicon-on-insulator substrate, and its propagation characteristics were evaluated using the Fabry-Perot resonance method. The propagation loss was of the order of 10 cm-1, and was dominated by light scattering at rough interfaces. However, a large modal effective index of more than 4.5 and a low bend loss of less than 1 dB at a 0.5-µm-radius bend were also observed. These results suggest the potential of an ultrasmall and high-density lightwave circuit, which accepts the relatively large propagation loss.
URL:
http://jjap.jsap.jp/link?JJAP/40/L383/
DOI: 10.1143/JJAP.40.L383
KEYWORDS:SOI, optical waveguide, integrated photonics, lightwave circuit
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