Jpn. J. Appl. Phys. 42 (2003) pp. 2639-2648  |Next Article|  |Table of Contents|
|Full Text PDF (714K)| |Buy This Article|

Design of Phase-Shift Masks in Extreme Ultraviolet Lithography

Minoru Sugawara, Akira Chiba and Iwao Nishiyama

(Received September 3, 2002; revised manuscript revised November 15, 2002; accepted for publication November 22, 2002)

An attenuated phase-shift mask (att-PSM) and an alternating phase-shift mask (alt-PSM) were designed for extreme ultraviolet lithography (EUVL). For an att-PSM, a bilayer structure is newly designed. The bilayer structure provides appropriate attenuated reflectance by choosing thicknesses and ensures sufficient thickness latitude. For the alt-PSM, the additive structure is newly introduced. The new additive structure generates 180 degrees of phase shift and uniform reflectance simultaneously. The new alt-PSM is constituted of materials of TaN, Ru, Si and Mo that have been already made available in a binary mask. An appropriate combination of materials in the additive structure also gives a flat surface structure. The new PSMs enable the fabrication of smaller gates with lengths of 18 nm or below.

URL: http://jjap.jsap.jp/link?JJAP/42/2639/
DOI: 10.1143/JJAP.42.2639

References | Citing Articles (2)

1. T. Terasawa, N. Hasegawa, H. Fukuda and S. Katagiri: Jpn. J. Appl. Phys. 30 (1991) 2991[JSAP].
2. A. Otaka, Y. Kawai and T. Matsuda: Jpn. J. Appl. Phys. 32 (1993) 5880[JSAP].
3. Y. Iwabuchi, J. Ushioda, H. Tanabe, Y. Ogura and S. Kishida: Jpn. J. Appl. Phys. 32 (1993) 5900[JSAP].
4. I. Kagami, M. Sugawara, H. Kawahira, K. Tsudaka, K. Ishikawa, S. Nozawa, H. Shimizu and T. Ogawa: Jpn. J. Appl. Phys. 34 (1995) 6590[JSAP].
5. M. D. Levenson, N. S. Viswanathan and R. A. Simpson: IEEE Trans. Electron Devices 29 (1982) 1828.
6. M. Sugawara, H. Kawahira, K. Tsudaka, A. Ogura and S. Nozawa: Jpn. J. Appl. Phys. 33 (1994) 6801[JSAP].
7. Han, J. R. Easson, P. J. Mangat, J. L. Cobb and S. D. Hector: Proc. of SPIE 4688 (2002) p. 481.
8. M. Ito, S. Katagiri, H. Yamanashi, E. Seya, T. Ogawa, H. Oizumi and T. Terasawa: OSA Trends on Optics and Photonics, eds. G. D. Kubiak and D. R. Kania (Optical Society of America, Washington, DC, 1996) Vol. 4, p. 9.
9. M. Yamamoto and T. Namioka: Appl. Opt. 31 (1992) 1622.
10. T. V. Pistor: Thesis, University of California Berkeley, 2000.
11. T. V. Pistor, K. Adam and N. Neureuther: J. Vac. Sci. Technol. B 16 (1998) 3449[AIP Scitation].
12. C. A. Mack and P. M. Kaufman: J. Vac. Sci. Technol. B 6 (1988) 2213[AIP Scitation].
13. B. T. Lee, E. Hoshino, M. Takahashi, T. Yoneda, H. Yamanashi, H. Hoko, M. Ryoo, A. Chiba, M. Ito, M. Sugawara, T. Ogawa and S. Okazaki: Jpn. J. Appl. Phys. 40 (2001) 6998[JSAP].