Jpn. J. Appl. Phys. 43 (2004) pp. 351-352  |Table of Contents|
|Abstract| |Full Text PDF (84K)| |Buy This Article|

Effects of Air Exposure on SiO₂ Surfaces Irradiated with Fluorocarbon Plasma

Kazuaki Kurihara, Yoshikazu Yamaoka and Makoto Sekine

Articles citing this article

The list of citing articles is based on data provided by CrossRef Cited-by Linking. Any errors or omissions are the responsibility of the primary publisher.

1. Applied Physics Express 4 (2011) 086201

   Effective Species in Inductively Coupled Nitrogen Plasma for Silicon Nitriding

   Yoshimine Horikawa, Kazuaki Kurihara, and Koichi Sasaki

2. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 24 (2006) 286

   Structure of surface reaction layer of poly-Si etched by fluorocarbon plasma

   Kazuaki Kurihara, Akihiko Egami, and Moritaka Nakamura

3. Journal of Applied Physics 97 (2005) 053302

   Mass-analyzed CF_x[sup +] (x=1,2,3) ion beam study on selectivity of SiO₂-to-SiN etching and a-C:F film deposition

   Ken-ichi Yanai, Kazuhiro Karahashi, Kenji Ishikawa, and Moritaka Nakamura

4. Japanese Journal of Applied Physics 43 (2004) L1284

   Enhancement of Copper Surface Oxidation in an Air Atmosphere Due to Fluorine Residue

   Kazuaki Kurihara