Jpn. J. Appl. Phys. 43 (2004) pp. 3663-3667
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Most Efficient Alternative Manner of Patterning sub-80 nm Contact Holes and Trenches with 193 nm Lithography
Jung Hwan Hah, Jin-Young Yoon, Mitsuhiro Hata, Sang Wook Kim, Hyun-Woo Kim, Sang-Gyoun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon and Byoung-Il Ryu
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