Jpn. J. Appl. Phys. 43 (2004) pp. 3663-3667  |Table of Contents|
|Abstract| |Full Text PDF (299K)| |Buy This Article|

Most Efficient Alternative Manner of Patterning sub-80 nm Contact Holes and Trenches with 193 nm Lithography

Jung Hwan Hah, Jin-Young Yoon, Mitsuhiro Hata, Sang Wook Kim, Hyun-Woo Kim, Sang-Gyoun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon and Byoung-Il Ryu

Articles citing this article

The list of citing articles is based on data provided by CrossRef Cited-by Linking. Any errors or omissions are the responsibility of the primary publisher.

  1. Journal of The Electrochemical Society 154 (2007) H894
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    Hideo Eto, Maki Miyazaki, Takehiro Kondoh, Eishi Shiobara, Shinichi Ito, and Tetsuya Homma
  2. Japanese Journal of Applied Physics 45 (2006) 7964
    Parallelizable Simulation of Material Effects of Chemical Shrink Process of Nanolithography
    Tsung-Lung Li, Jyh-Hua Ting and Chung-Yuan Kung
  3. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 24 (2006) 795
    Chemical shrinkage material: Nanoscale patterning through interpolymer complex
    Mitsuhiro Hata, Jung-Hwan Hah, Hyun-Woo Kim, Man-Hyoung Ryoo, Sang-Jun Choi, Sang-Gyun Woo, and Han-Ku Cho
  4. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 24 (2006) 2209
    Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193 nm photolithography: Top-down meets bottom-up
    Jung Hwan Hah, Subramanya Mayya, Mitsuhiro Hata, Yun-Kyeong Jang, Hyun-Woo Kim, Manhyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, and Joo-Tae Moon
  5. Chemical Physics Letters 414 (2005) 292
    Reaction-diffusion mechanisms for the chemical shrink process of nanofabrication
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  6. Japanese Journal of Applied Physics 44 (2005) 6327
    Temporal Saturation Effects of Nanoscale Contact Holes Fabricated by Chemical Shrink Techniques
    Tsung-Lung Li and Jyh-Hua Ting


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