Jpn. J. Appl. Phys. 43 (2004) pp. 3971-3973  |Previous Article| |Next Article|  |Table of Contents|
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Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists

Hiroki Yamamoto, Atsuro Nakano, Kazumasa Okamoto, Takahiro Kozawa and Seiichi Tagawa

(Received October 30, 2003; revised January 6, 2004; accepted January 7, 2004; published June 29, 2004)

In the acid generation processes of chemically amplified electron beam and X-ray resists, protons come from not acid generators but base polymers. This means that the selection of base polymers has a great effect on the acid generation efficiency. In this article we describe a convenient method of screening polymers for acid generation. We also showed the difference in acid generation efficiencies among substituted polystyrenes.

URL: http://jjap.jsap.jp/link?JJAP/43/3971/
DOI: 10.1143/JJAP.43.3971

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