Jpn. J. Appl. Phys. 43 (2004) pp. 3981-3983  |Previous Article| |Next Article|  |Table of Contents|
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Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices

Atsuro Nakano, Kazumasa Okamoto, Takahiro Kozawa and Seiichi Tagawa

(Received October 30, 2003; accepted January 28, 2004; published June 29, 2004)

The control of acid generation and diffusion is essential for the improvement of resist performance based on the chemical amplification concept. Polymethacrylates are excellent matrices to study resist reaction mechanisms. The dependence of polymer structure on acid generation and diffusion was investigated using polymethacrylate matrices. The ester groups of the polymers strongly affect the yield and diffusion of protons. This suggests that the yield and the diffusion constant of the acid can be controlled in chemically amplified resists based on a polymethacrylate copolymer by changing the composite ratio of the units.

URL: http://jjap.jsap.jp/link?JJAP/43/3981/
DOI: 10.1143/JJAP.43.3981

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