Jpn. J. Appl. Phys. 43 (2004) pp. 4017-4021  |Previous Article| |Next Article|  |Table of Contents|
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Sub-100-nm Photolithography Based on Plasmon Resonance

Xiangang Luo and Teruya Ishihara

(Received October 30, 2003; accepted January 9, 2004; published June 29, 2004)

Sub-100-nm patterns have been patterned photolithographically using metallic masks with the exposure wavelength of 436 nm. Preliminary numerical simulations indicate a practical resolution limit for the lithographic process. The near-field distribution of light can be optimized to fabricate nanostructures including isolated nano-dots or nano-lines by changing the parameters of the mask. The results show the potential of plasmon lithography for attaining subwavelength features.

URL: http://jjap.jsap.jp/link?JJAP/43/4017/
DOI: 10.1143/JJAP.43.4017

References | Citing Articles (12)

1. S. Y. Chou, P. R. Krauss and P. J. Renstrom: J. Vac. Sci. & Technol. B 14 (1996) 4129[AIP Scitation].
2. M. A. McCord: J. Vac. Sci. & Technol. B 15 (1997) 2125[AIP Scitation].
3. J. Melngailis: Nucl. Instrum. & Methods B 80 (1993) 1271.
4. M. A. McCord and R. F. W. Pease: J. Vac. Sci. & Technol. B 4 (1986) 86[AIP Scitation].
5. Z. Betzig and J. K. Trautman: Science 257 (1992) 189[Science].
6. M. Rothschild, T. M. Bloomstein, J. E. Curtin, D. K. Downs, T. H. Fedynyshyn, D. E. Hardy, R. R. Kunz, V. Liberman, J. H. C. Sedlacek, R. S. Uttaro, A. K. Bates and C. Van Peski: J. Vac. Sci. & Technol. B 17 (1999) 3262[AIP Scitation].
7. C. W. Gwyn, R. Stulen, D. Sweeney and D. Attwood: J. Vac. Sci. & Technol. B 16 (1998) 3142[AIP Scitation].
8. J. P. Silverman: J. Vac. Sci. & Technol. B 16 (1998) 3137[AIP Scitation].
9. M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung and D. R. S. Cumming: Appl. Phys. Lett. 75 (1999) 3560[AIP Scitation].
10. J. G. Goodberlet: Appl. Phys. Lett. 76 (2000) 667[AIP Scitation].
11. R. J. Blaikie and S. McNab: Appl. Opt. 40 (2001) 1692.
12. S. J. McNab and R. J. Blaikie: Appl. Opt. 39 (2000) 20.
13. H. A. Bethe: Phys. Rev. 66 (1944) 163[APS].
14. X. Luo and T. Ishihara: Int. J. Nanoscience 1 (2002) 657.
15. T. W. Ebbesen, H. L. Lezec, H. F. Ghaemi, T. Thio and P. A. Wolff: Nature 391 (1998) 667[CrossRef].
16. H. F. Ghaemi, T. Thio, D. E. Grupp, T. W. Ebbesen and H. J. Lezec: Phys. Rev. B 58 (1998) 6779[APS].
17. L. Salomon, F. Grillot, A. Zayats and F. De Fornel: Phys. Rev. Lett. 86 (2001) 1110[APS].
18. E. Popov, M. Neviere, S. Enoch and R. Reinisch: Phys. Rev. B 62 (2000) 16100[APS].
19. U. Schroter and D. Heitmann: Phys. Rev. B 58 (1998) 15419[APS].
20. L. Martin-Moreno, F. J. Garcia-Vidal, H. J. Lezec, K. M. Pellerin, T. Thio, J. B. Pendry and T. W. Ebbesen: Phys. Rev. Lett. 86 (2001) 1114[APS].
21. J. A. Porto, F. J. Garcia-Vidal and J. B. Pendry: Phys. Rev. Lett. 83 (1999) 2845[APS].
22. Handbook of Optical Constants of Solids, ed. E. D. Palik (Academic, Orlando, 1985) p. 350.
23. H. J. Lezec, A. Degiron, E. Devaux, R. A. Linke, L. Martin-Moreno, F. J. Garcia-Vidal and T. W. Ebbesen: Science 297 (2002) 820[Science].