Jpn. J. Appl. Phys. 43 (2004) pp. L1045-L1047 |Previous Article| |Next Article| |Table of Contents|
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Letter
Nanoscale Dots Fabrication by Volume Change Thermal Lithography
Masashi Kuwahara,
Jooho Kim1,
Duseop Yoon1 and
Junji Tominaga
Center for Applied Near-Field Optics Research (CAN-FOR), National Institute of Advanced Industrial Science and Technology (AIST), Central 4, 1-1-1 Higashi, Tsukuba 305-8562, Japan
1Digital Media R&D Center, Samsung Electronics Co., Ltd., 416 Maetan-3Dong, Paldal-Gu, Suwon City, Kyungki-Do 442-742, Korea
(Received March 15, 2004; accepted June 18, 2004; published July 23, 2004)
We have developed a novel lithography technique, called the “volume-change thermal-lithography”, for fabricating minute dots in less than 100 nm diameter. The combination of the temperature distribution induced by a focused laser beam with a Gaussian distribution and a specially designed multilayer, which consists of TbFeCo and ZnS-SiO2 films, enabled us to produce minute dots. Using a laser beam with a 405 nm wavelength, we succeeded in fabricating dots whose pitch and size are far beyond the optical diffraction limit. Furthermore, we delineated letters of approximately 1 µm size by dot arrangement for showing the high potential for more complicate fabrication using the technique.
URL:
http://jjap.jsap.jp/link?JJAP/43/L1045/
DOI: 10.1143/JJAP.43.L1045
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