Quick Search: Journal  Author  Title/Abstract  Vol./Year 

Jpn. J. Appl. Phys. 43 (2004) pp. L1054-L1056  |Previous Article| |Next Article|  |Table of Contents|
|Full Text PDF (108K)| |Buy This Article|

Letter

Large Temperature Coefficient of Resistance in La0.7Ca0.3MnO3 Thin Films Obtained by Metal Organic Deposition Process

Kais Daoudi, Tetsuo Tsuchiya, Susumu Mizuta, Iwao Yamaguchi, Takaaki Manabe and Toshiya Kumagai

National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan

(Received March 31, 2004; accepted June 15, 2004; published July 23, 2004)

La0.7Ca0.3MnO3 (LCMO) thin films with perovskite structure were successfully grown by metal-organic deposition (MOD) on LaAlO3 (001) substrates. The epitaxial growth of the films was confirmed by X-ray diffraction (θ-2θ scans and pole-figure analysis). The temperature coefficient of resistance (TCR) was calculated from the temperature dependence of the resistance measurements. The effects of annealing temperature and film thickness on the resistance and TCR were investigated. The LCMO thin films present a high resistivity-peak temperature of approximately 264 K. The LCMO thin films obtained by MOD show a maximum TCR of ∼27.5%/K, and can be considered as good candidates for bolometric applications.

URL: http://jjap.jsap.jp/link?JJAP/43/L1054/
DOI: 10.1143/JJAP.43.L1054


|Full Text PDF (108K)| |Buy This Article| Citation:

References | Citing Articles (8)

  1. K. Chahara, T. Ohno, M. Kasai and Y. Kozono: Appl. Phys. Lett. 63 (1993) 1990[AIP Scitation].
  2. R. von Helmlot, J. Weckerg, B. Holzapfel, L. Schultz and K. Samwer: Phys. Rev. Lett. 71 (1993) 2331[APS].
  3. S. Jin, T. H. Tiefel, M. McCormack, R. A. Fastnacht, R. Ramesh and L. H. Chen: Science 264 (1994) 413[Science].
  4. M. Rajeswari, C. H. Chen, A. Goyal, C. Kwon, M. C. Robson, R. Ramesh, T. Venkatesan and S. Lakeou: Appl. Phys. Lett. 68 (1996) 3555[AIP Scitation].
  5. A. Goyal, M. Rajeswari, R. Shreekala, S. E. Lofland, S. M. Bhagat, T. Boettcher, C. Kwon, R. Ramesh and T. Venkatesan: Appl. Phys. Lett. 71 (1997) 2535[AIP Scitation].
  6. R. Bathe, K. P. Adhi, S. I. Patil, G. Marest, B. Hannoyer and S. B. Ogale: Appl. Phys. Lett. 76 (2000) 2104[AIP Scitation].
  7. M. A. Todd, P. P. Donohue, R. Watton, D. J. Williams, C. J. Anthony and M. G. Blamire: Proc. SPIE Int. Soc. Opt. Eng. 4795 (2002) 88[AIP Scitation].
  8. C. J. Lu, Z. L. Wang, C. Kwon and Q. X. Jia: J. Appl. Phys. 88 (2000) 4032[AIP Scitation].
  9. E. S. Vlakhov, R. A. Chakalov, R. I. Chakalova, K. A. Nenkov, K. Dorr, A. Handstein and K. H. Muller: J. Appl. Phys. 83 (1998) 2152[AIP Scitation].
  10. J. O'Donnell, M. Onellion, M. S. Rzchowski, J. N. Eckstein and I. Bozovic: Phys. Rev. B 54 (1996) R6841[APS].
  11. D. C. Worledge, G. J. Snyder, M. R. Beasley, T. H. Geballe, R. Hiskes and S. DiCarolis: J. Appl. Phys. 80 (1996) 5158[AIP Scitation].
  12. T. Kumagai, T. Manabe, W. Kondo and S. Mizuta: Jpn. J. Appl. Phys. 30 (1991) L28[JSAP].
  13. T. Manabe, W. Kondo, S. Mizuta and T. Kumagai: Appl. Phys. Lett. 60 (1992) 3301[AIP Scitation].
  14. T. Manabe, I. Yamaguchi, W. Kondo, S. Mizuta and T. Kumagai: J. Mater. Res. 12 (1997) 541.
  15. T. Manabe, T. Fujimoto, I. Yamaguchi, W. Kondo, I. Kojima, S. Mizuta and T. Kumagai: Thin Solid Films 323 (1998) 99[CrossRef].
  16. T. Tsuchiya, I. Yamaguchi, T. Manabe, T. Kumagai and S. Mizuta: Mater. Sci. Eng. B 109 (2004) 131.
  17. P. Schiffer, A. P. Ramirez, W. Bao and S. W. Cheong: Phys. Rev. Lett. 75 (1995) 3336[APS].
  18. S. Jin, T. H. Tiefel, M. McCormack, H. M. O'Bryan, L. H. Chen, R. Ramesh and D. Schurig: Appl. Phys. Lett. 67 (1995) 557[AIP Scitation].
|TOP|  |Previous Article| |Next Article|  |Table of Contents| |JJAP Home|
Copyright © 2013 The Japan Society of Applied Physics
Contact Information