Jpn. J. Appl. Phys. 43 (2004) pp. L647-L648  |Previous Article| |Next Article|  |Table of Contents|
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Giant Ferroelectric Polarization Beyond 150 µC/cm2 in BiFeO3 Thin Film

Kwi Young Yun, Dan Ricinschi, Takeshi Kanashima, Minoru Noda and Masanori Okuyama

Division of Advanced Electronics and Optical Science, Department of System Innovation, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan

(Received March 16, 2004; accepted March 18, 2004; published April 16, 2004)

Ferroelectric BiFeO3 thin films have been deposited on Pt/TiO2/SiO2/Si substrate by pulsed-laser deposition. From the X-ray diffraction analysis, the BiFeO3 thin film consists of perovskite single-phase, and the crystal structure shows the tetragonal structure (c/a = 1.018) with a space group P4mm. It is obtained that the BiFeO3 thin film shows a well-saturated remarkably giant saturation polarization of 158 µC/cm2 and a remanent polarization of 146 µC/cm2 for a maximum applied voltage of 20 V at 90 K. These values of polarization are largest ever-measured in ferroelectrics.

URL: http://jjap.jsap.jp/link?JJAP/43/L647/
DOI: 10.1143/JJAP.43.L647


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References | Citing Articles (141)

  1. H. Miyazawa, E. Natori, T. Shimoda, H. Kishimoto, F. Ishii and T. Oguchi: Jpn. J. Appl. Phys. 40 (2001) 5809[JSAP].
  2. S. Tinte, K. M. Rabe and D. Vanderbilt: Phys. Rev. B 68 (2003) 144105[APS].
  3. J. Ìñiguez, D. Vanderbilt and L. Bellaiche: Phys. Rev. B 67 (2003) 224107[APS].
  4. S. Yokoyama, Y. Honda, H. Morioka, T. Oikawa, H. Funakubo, T. Iijima, H. Matsuda and K. Saito: Appl. Phys. Lett. 83 (2003) 2408[AIP Scitation].
  5. J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig and R. Ramesh: Science 299 (2003) 1719[Science].
  6. K. Y. Yun, M. Noda, M. Okuyama, H. Saeki, H. Tabata and K. Saito: submitted to J. Appl. Phys.
  7. K. Y. Yun, D. Ricinschi, M Noda and M. Okuyama: unpublished.

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