Jpn. J. Appl. Phys. 44 (2005) pp. 865-868  |Previous Article| |Next Article|  |Table of Contents|
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Microscale Metal Patterning Using Photosensitive Silver Organometallic Compounds

Jin Young Kim, Hae Jung Son, Young-Hun Byun, Sang Yoon Lee, Eok Chai Hwang, Ki Yong Song, Chang Ho Noh¹ and Jin Baek Kim¹

(Received July 19, 2004; accepted October 22, 2004; published February 8, 2005)

We report a simple method for realizing the direct lithographic patterning of metallic silver and its alloy from amorphous films of photosensitive silver organometallic compounds. In this process, ultraviolet (UV) light was used to selectively activate organometallic compounds, converting organometallic compounds to metallic states in illuminated regions. The photolysis process was monitored by FTIR spectroscopy and the products were analyzed by UV–visible light spectrometry, X-ray photoelectron spectroscopy (XPS), and X-ray diffraction analysis (XRD). A feature size of 5 µm was demonstrated through the process.

URL: http://jjap.jsap.jp/link?JJAP/44/865/
DOI: 10.1143/JJAP.44.865

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