Quick Jump

Jpn. J. Appl. Phys. 44 (2005) pp. L1100-L1102  |Next Article|  |Table of Contents|
|Full Text PDF (178K)| |Buy This Article|

Express Letter

Huge Spin-Polarization of L2₁-Ordered Co₂MnSi Epitaxial Heusler Alloy Film

Yuya Sakuraba, Jun Nakata, Mikihiko Oogane, Hitoshi Kubota¹, Yasuo Ando, Akimasa Sakuma and Terunobu Miyazaki

Department of Applied Physics, Graduate School of engineering, Tohoku University, Aoba-yama 05, Aramaki, Aoba-ku, Sendai 980-8579, Japan
¹Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba 305-8568, Japan

(Received July 19, 2005; accepted July 31, 2005; published August 19, 2005)

Magnetic tunnel junctions (MTJs) with a stacking structure of epitaxial Co₂MnSi/Al–O barrier/poly-crystalline Co₇₅Fe₂₅ were fabricated using an ultrahigh vacuum sputtering system. The epitaxial Co₂MnSi bottom electrode exhibited highly ordered L2₁ structure and very smooth surface morphology. Observed magnetoresistance (MR) ratios of 70% at room temperature (RT) and 159% at 2 K are the highest values to date for MTJs using a Heusler alloy electrode. A high spin-polarization of 0.89 at 2 K for Co₂MnSi obtained from Julliere's model coincided with the half-metallic band structure that was predicted by theoretical calculations.

URL: http://jjap.jsap.jp/link?JJAP/44/L1100/
DOI: 10.1143/JJAP.44.L1100

|Full Text PDF (178K)| |Buy This Article| Citation: Plain Text BiBTeX EndNote(RIS) RSS

---

References | Citing Articles (108)

1. S. Yuasa, T. Nagahama, A. Fukushima, Y. Suzuki and K. Ando: Nat. Mater. 3 (2004) 868[CrossRef].
2. S. S. Parkin, C. Kaiser, A. Panchula, P. M. Rice, B. Hughes, M. Samant and S.-H. Yang: Nat. Mater. 3 (2004) 862[CrossRef].
3. D. D. Djayaprawira, K. Tsunekawa, M. Nagai, H. Maehara, S. Yamagata, N. Watanabe, S. Yuasa, Y. Suzuki and K. Ando: Appl. Phys. Lett. 86 (2005) 092502[AIP Scitation].
4. J. Hayakawa, S. Ikeda, F. Matsukura, H. Takahashi and H. Ohno: Jpn. J. Appl. Phys. 44 (2005) L587[JSAP].
5. W. H. Butler, X.-G. Zhang, T. C. Schulthess and J. M. MacLaren: Phys. Rev. B 63 (2001) 054416[APS].
6. J. Mathon and A. Umerski: Phys. Rev. B 63 (2001) 220403[APS].
7. M. Julliere: Phys. Lett. A 54 (1975) 225[CrossRef].
8. X.-F. Han, M. Oogane, H. Kubota, Y. Ando and T. Miyazaki: Appl. Phys. Lett. 77 (2000) 283[AIP Scitation].
9. D. Wang, C. Nordman, J. M. Daughton, Z. Qian and J. Fink: IEEE Trans. Magn. 40 (2004) 2269.
10. S. Ishida, S. Fujii, S. Kashiwagi and S. Asano: J. Phys. Soc. Jpn. 64 (1995) 2152.
11. I. Galanakis, P. H. Dederiches and N. Papanikolaou: Phys. Rev. B 66 (2002) 174429[APS].
12. S. Picozzi, A. Continenza and A. J. Freeman: Phys. Rev. B 66 (2002) 094421[APS].
13. S. Kämmerer, A. Thomas, A. Hütten and G. Reiss: Appl. Phys. Lett. 85 (2004) 79[AIP Scitation].
14. K. Inomata, S. Okamura, R. Goto and N. Tezuka: Jpn. J. Appl. Phys. 42 (2002) L419[JSAP].
15. K. Inomata, N. Tezuka, S. Okamura, H. Kobayashi and A. Hirohata: J. Appl. Phys. 95 (2004) 7234[AIP Scitation].
16. S. Okamura, A. Miyazaki, S. Sugimoto, N. Tezuka and K. Inomata: Appl. Phys. Lett. 86 (2005) 232503[AIP Scitation].
17. H. Kubota, J. Nakata, M. Oogane, Y. Ando, A. Sakuma and T. Miyazaki: Jpn. J. Appl. Phys. 43 (2004) L984[JSAP].
18. W. H. Wang, M. Pryzybylski, W. Kuch, L. I. Chelaru, J. Wang, Y. F. Lu, J. Barthel and J. Kirschner: J. Magn. Magn. Mater. 286 (2005) 336[CrossRef].
19. W. H. Wang, M. Pryzybylski, W. Kuch, L. I. Chelaru, J. Wang, Y. F. Lu, J. Barthel, H. L. Meyerheim and J. Kirschner: Phys. Rev. B 71 (2005) 144416[APS].
20. X. Y. Dong, C. Adelmann, J. Q. Xie, C. J. Palmstrøm, X. Lou, J. Strand, P. A. Crowell, J.-P. Barnes and A. K. Petford-Long: Appl. Phys. Lett. 86 (2005) 102107[AIP Scitation].
21. S. Picozzi, A. Continenza and A. J. Freeman: Phys. Rev. B 69 (2004) 094423[APS].
22. Y. Miura, K. Nagao and M. Shirai: Phys. Rev. B 69 (2004) 144413[APS].
23. B. Ravel, M. P. Raphael, Q. Huang and V. G. Harris: Phys. Rev. B 65 (2002) 184431[APS].
24. S. B. Ravel, J. O. Cross, M. P. Raphael, V. G. Harris, R. Ramesh and V. Saraf: Appl. Phys. Lett. 81 (2002) 2812[AIP Scitation].
25. T. Dimopoulos, Y. Henry, V. Da Costa, C. Tiusan and K. Ounadjela: J. Appl. Phys. 95 (2004) 6963[AIP Scitation].
26. J. Schmalhorst, S. Kämmerer, M. Sacher, G. Reiss and A. Hütten: Phys. Rev. B 70 (2004) 024426[APS].

---