Jpn. J. Appl. Phys. 46 (2007) pp. 1590-1595 |Previous Article| |Next Article| |Table of Contents|
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Searching for Novel Ru-Based Thin Film Metallic Glass by Combinatorial Arc Plasma Deposition
Precision and Intelligence Laboratory, Tokyo Institute of Technology, R2-37, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
1Frontier Collaborative Research Center, Tokyo Institute of Technology, S2-8, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
(Received November 21, 2006; accepted December 30, 2006; published online April 5, 2007)
We found out a novel Ru–Zr–Al thin film metallic glass by combinatorial arc plasma deposition (CAPD). To search for Ru-based thin film metallic glasses, first, a library of 1,089 CAPD samples was deposited, of which fifteen amorphous samples were selected by X-ray diffractometry. The compositions of these samples were measured by energy dispersive X-ray fluorescence spectrometry. From the fifteen samples, two samples having low Al content (Ru65Zr30Al5 and Ru67Zr25Al8, at. %) were chosen, and their compositions were reproduced in samples deposited by sputtering, because the CAPD samples were too small for evaluating the glass transition temperature Tg and crystallization temperature Tx by differential scanning calorimetry (DSC). DSC revealed that the two sputter-deposited samples Ru65Zr30Al5 and Ru67Zr25Al8 had a supercooled liquid region (SCLR), showing a Tg, Tx, and width of SCLR ΔTx (=Tx-Tg) of 902, 973, and 71 K in the case of Ru65Zr30Al5, and 913, 979, and 66 K in the case of Ru67Zr25Al8, respectively. Moreover, the sputter-deposited samples Ru65Zr30Al5 and Ru67Zr25Al8 exhibited superior mechanical properties. The fracture stress σf, elastic limit εl, and Young's modulus E were 1.9 GPa, 2.0% and 92.7 GPa, respectively, for Ru65Zr30Al5 and 1.9 GPa, 2.0%, and 91.6 GPa, respectively, for Ru67Zr25Al8.
KEYWORDS:thin film metallic glass, combinatorial arc plasma deposition method, carousel sputtering, amorphous forming ability
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