Jpn. J. Appl. Phys. 46 (2007) pp. 3566-3572  |Previous Article| |Next Article|  |Table of Contents|
|Full Text PDF (237K)| |Buy This Article|

Probe and Optical Emission Spectroscopy Measurement of Slotted Antenna-Excited Nitrogen Discharge Plasma

Reo Toyoyoshi, Takeshi Sakamoto, Haruaki Matsuura, and Hiroshi Akatsuka

Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology, 2-12-1-N1-10 O-Okayama, Meguro-ku, Tokyo 152-8550, Japan

(Received March 6, 2006; accepted February 17, 2007; published online June 6, 2007)

We generated and diagnosed a large-area planar surface wave nitrogen plasma excited by a slotted antenna applicator, which has four slots with an inclination angle of 75° with respect to the wall centerline. When the 2.45 GHz microwave power applied was larger than 500 W, a stable nitrogen plasma was generated as a large-area surface wave discharge. We carried out the optical emission spectroscopy measurement of the generated plasma and observed the intensity of the second positive system of nitrogen molecules. It was found that the vibrational temperature of the C state of nitrogen molecules is about 0.67–0.86 eV at the discharge pressures of 0.3–1.0 Torr and decreases with discharge pressure. The rotational temperature was found to be 0.13–0.14 eV, which is almost independent of discharge pressure. Probe measurement showed that the electron temperature and density are about 2.0–4.0 eV and in the order of 1011 cm-3, respectively. When the microwave power was as low as 400 W, a transition to a volume wave-excited plasma was observed, in which the electron density is less than the critical density for the 2.45 GHz microwave.

URL: http://jjap.jsap.jp/link?JJAP/46/3566/
DOI: 10.1143/JJAP.46.3566


|Full Text PDF (237K)| |Buy This Article| Citation:


References | Citing Articles (3)

  1. M. Kando: J. Plasma Fusion Res. 72 (1996) 629 [in Japanese].
  2. M. Nagatsu and H. Sugai: J. Plasma Fusion Res. 74 (1998) 479 [in Japanese].
  3. Research Committee of Microwave Plasmas, Institute of Electric Engineering Japan: Maikuro-ha Purazuma no Gijutsu (Technology of Microwave Plasmas) (Ohmsha, Tokyo, 2003) [in Japanese].
  4. E. Tatarova and D. Zamfirov: J. Phys. D 28 (1995) 1354[IoP STACKS].
  5. E. Tatarova, F. M. Dias, C. M. Ferreira, and A. Ricard: J. Appl. Phys. 85 (1999) 49[AIP Scitation].
  6. B. Gordiets, M. Pinheiro, E. Tatarova, F. M. Dias, C. M. Ferreira, and A. Ricard: Plasma Sources Sci. Technol. 9 (2000) 295[IoP STACKS].
  7. C. M. Ferreira, B. F. Gordiets, and E. Tatarova: Plasma Phys. Control. Fusion 42 (2000) B165[IoP STACKS].
  8. S. Koike, T. Sakamoto, H. Matsuura, and H. Akatsuka: Jpn. J. Appl. Phys. 43 (2004) 5550[JSAP].
  9. H. Kobori, S. Koike, S. Watanabe, M. Matsuzaki, H. Matsuura, and H. Akatsuka: Thin Solid Films 457 (2004) 69[CrossRef].
  10. H. Akatsuka and M. Suzuki: Plasma Sources Sci. Technol. 4 (1995) 125[IoP STACKS].
  11. R. N. Zare, E. O. Larsson, and R. A. Berg: J. Mol. Spectrosc. 15 (1965) 117.
  12. M. Phillips: J. Phys. D 9 (1976) 507[IoP STACKS].
  13. T. Sakamoto, H. Matsuura, and H. Akatsuka: Jpn. J. Appl. Phys. 45 (2006) 7905[JSAP].
  14. T. Sakamoto, H. Matsuura, and H. Akatsuka: J. Appl. Phys. 101 (2007) 023307[AIP Scitation].
  15. A. V. Phelps and L. C. Pitchford: Phys. Rev. A 31 (1985) 2932[APS].
  16. M. Capitelli, C. M. Ferreira, B. F. Gordiets, and A. I. Osipov: Plasma Kinetics in Atmospheric Gases (Springer, Berlin, 2000).
  17. S. Nunomura, M. Kondo, and H. Akatsuka: Plasma Sources Sci. Technol. 15 (2006) 783[IoP STACKS].
  18. K. P. Huber and G. Herzberg: Molecular Spectra and Molecular Structure (Van Nostrand Reinhold, New York, 1979).
  19. S. Nagakura, H. Iguchi, H. Ezawa, S. Iwamura, F. Sato, and R. Kubo: Rikagaku Jiten (Dictionary of Physics and Chemistry) (Iwanami, Tokyo, 1998) 5th ed., p. 472 [in Japanese].
  20. M. Ohki, T. Ohsawa, M. Tanaka, and H. Chihara: Kagaku Daijiten (Encyclopedic Dictionary of Chemistry) (Tokyo Kagaku Dojin, Tokyo, 1989) 1st ed., p. 466 [in Japanese].
  21. A. Ogino, K. Naito, F. Terashita, S. Nanko, and M. Nagatsu: Jpn. J. Appl. Phys. 44 (2005) L352[JSAP].
  22. N. Nagatsu, K. Naito, A. Ogino, and K. Ninomiya: Appl. Phys. Lett. 87 (2005) 161501[AIP Scitation].

|TOP|  |Previous Article| |Next Article|  |Table of Contents| |JJAP Home|
Copyright © 2013 The Japan Society of Applied Physics
Contact Information