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Jpn. J. Appl. Phys. 46 (2007) pp. 8003-8004  |Previous Article| |Next Article|  |Table of Contents|
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Brief Communication

Elementary Analysis of Diamond-Like Carbon Film Formed by Focused-Ion-Beam Chemical Vapor Deposition

Jun-ya Igaki1,2, Akihiko Saikubo1,2, Reo Kometani1,2,3, Kazuhiro Kanda1,2,, Tsuneo Suzuki4, Koichi Niihara4, and Shinji Matsui1,2

1University of Hyogo, Graduate School of Science, LASTI, Kamigori, Hyogo 678-1205, Japan
2CREST JST, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
3JSPS Research Fellow, Japan Society for the Promotion of Science, Tokyo 102-8472, Japan
4Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan

(Received June 5, 2007; accepted September 6, 2007; published online December 6, 2007)

This is the first report on the precise elemental composition of a diamond-like carbon (DLC) thin film fabricated by focused-ion-beam chemical vapor deposition (FIB-CVD). The atomic fraction of the FIB-CVD DLC film has been determined to be C:Ga:H=87.4:3.6:9.0 at. % using Rutherford backscattering spectrometry (RBS) and elastic recoil detection analysis (ERDA). The hydrogen content of the FIB-CVD DLC film was lower than that of DLC films formed using other CVD methods.

URL: http://jjap.jsap.jp/link?JJAP/46/8003/
DOI: 10.1143/JJAP.46.8003


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