Jpn. J. Appl. Phys. 46 (2007) pp. L1225-L1227  |Next Article|  |Table of Contents|
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Express Letter

Modulation of Young's Modulus of Poly(methyl methacrylate) Nanobeam Due to Electron-Beam Exposure

Kenji Yamazaki, Toru Yamaguchi, and Hiroshi Yamaguchi

NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan

(Received October 2, 2007; accepted December 3, 2007; published online December 14, 2007)

We fabricated suspended poly(methyl methacrylate) (PMMA) micro/nanobeams using a novel two-step development process. Young's moduli measured for the fabricated beams were found to decrease with additional electron-beam (EB) exposure. This means that we can locally control Young's modulus in PMMA structure using EB exposure and thus effectively design nanoelectromechanical systems using this organic material. The effect was more significant for smaller beams, suggesting that the modulus of the near-surface region is largely affected.

URL: http://jjap.jsap.jp/link?JJAP/46/L1225/
DOI: 10.1143/JJAP.46.L1225


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