Jpn. J. Appl. Phys. 46 (2007) pp. L898-L900  |Previous Article| |Next Article|  |Table of Contents|
|Full Text PDF (149K)| |Buy This Article|

Letter

Observation of Magnetization Reversal Process in Ni–Fe Nanowire Using Magnetic Field Sweeping-Magnetic Force Microscopy

Yasushi Endo1, Yusuke Matsumura1, Hideki Fujimoto1, Ryoichi Nakatani1,2, and Masahiko Yamamoto1

1Department of Materials Science and Engineering, Graduate School of Engineering, Osaka University, Yamadaoka, Suita, Osaka 565-0871, Japan
2Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Yamadaoka, Suita, Osaka 565-0871, Japan

(Received July 7, 2007; accepted August 16, 2007; published online September 21, 2007)

The details of the magnetization reversal process of Ni–Fe nanowires, which were 10, 30, and 50-nm thick, were successfully observed using our newly proposed magnetization measurement method, namely, magnetic field sweeping (MFS)-magnetic force microscopy (MFM). All the points within the nanowire show marked phase changes (stray fields change) as the magnetic field is varied. In particular, each nanowire edge displays a hysteresis loop, while the center shows a sharp jump or a plateau area. These results demonstrate that domain wall motion is dominant in the magnetization reversal process of a 10-nm-thick Ni–Fe nanowire and that domain wall motion along with domain wall pinning play important roles in the magnetization reversal process in both 30- and 50-nm-thick Ni–Fe nanowires.

URL: http://jjap.jsap.jp/link?JJAP/46/L898/
DOI: 10.1143/JJAP.46.L898


|Full Text PDF (149K)| |Buy This Article| Citation:


References | Citing Articles (5)

  1. R. P. Cowburn: J. Phys. D 33 (2000) R1[IoP STACKS].
  2. J. I. Martín, J. Nogués, K. Liu, J. L. Vicent, and I. K. Schuller: J. Magn. Magn. Mater. 256 (2003) 449[CrossRef].
  3. S. S. P. Parkin, K. P. Roche, M. G. Samant, P. M. Rice, R. B. Beyers, R. E. Scheuerlein, E. J. O'Sullivan, S. L. Brown, J. Bucchigano, D. W. Abraham, Y. Lu, M. Rooks, P. L. Trouilloud, R. A. Wanner, and W. J. Gallagher: J. Appl. Phys. 85 (1999) 5828[AIP Scitation].
  4. R. Nakatani, T. Yoshida, Y. Endo, Y. Kawamura, M. Yamamoto, T. Takenaga, S. Aya, T. Kuroiwa, S. Beysen, and H. Kobayashi: J. Magn. Magn. Mater. 286 (2005) 31[CrossRef].
  5. J. Moritz, L. Buda, B. Dieny, J. P. Nozières, R. J. M. van de Veerdonk, T. M. Crawford, and D. Weller: Appl. Phys. Lett. 84 (2004) 1519[AIP Scitation].
  6. S. A. Haque, M. Yamamoto, R. Nakatani, and Y. Endo: Sci. Technol. Adv. Mater. 5 (2004) 79[CrossRef].
  7. S. A. Haque, M. Yamamoto, R. Nakatani, and Y. Endo: J. Magn. Magn. Mater. 282 (2004) 380[CrossRef].
  8. D. A. Allwood, G. Xiong, M. D. Cooke, C. C. Faulkner, D. Atkinson, N. Vernier, and R. P. Cowburn: Science 296 (2002) 2003[Science].
  9. J. Grollier, P. Boulenc, V. Cros, A. Hamzić, A. Vaurès, A. Fert, and G. Faini: Appl. Phys. Lett. 83 (2003) 509[AIP Scitation].
  10. T. Ono, H. Miyajima, K. Shigeto, K. Mibu, N. Hosoito, and T. Shinjo: Science 284 (1999) 468[Science].
  11. A. Yamaguchi, T. Ono, S. Nasu, K. Miyake, K. Mibu, and T. Shinjo: Phys. Rev. Lett. 92 (2004) 077205[APS].
  12. W. Wernsdorfer, K. Hasselbach, A. Benoit, W. Wernsdorfer, B. Barbara, D. Mailly, J. Tuaillon, J. P. Perez, V. Dupuis, J. P. Dupin, G. Guiraud, and A. Perex: J. Appl. Phys. 78 (1995) 7192[AIP Scitation].
  13. O. Fruchart, J.-C. Toussaint, P.-O. Jubert, W. Wernsdorfer, R. Hertel, J. Kirschner, and D. Mailly: Phys. Rev. B 70 (2004) 172409[APS].
  14. Y. Li, P. Xiong, S. von Molnar, S. Wirth, Y. Ohno, and H. Ohno: Appl. Phys. Lett. 80 (2002) 4644[AIP Scitation].
  15. N. Kikuchi, S. Okamoto, O. Kitakami, Y. Shimada, and K. Fukamichi: Appl. Phys. Lett. 82 (2003) 4313[AIP Scitation].
  16. Y. Endo, H. Fujimoto, Y. Kawamura, R. Nakatani, and M. Yamamoto: J. Magn. Magn. Mater. 310 (2007) 2436[CrossRef].
  17. J. Sato, Y. Endo, Y. Shiratsuchi, Y. Kawamura, R. Nakatani, M. Yamamoto, Y. Murakami, and A. Takahashi: Jpn. J. Appl. Phys. 46 (2007) 4117[JSAP].
  18. W. Rave and A. Hubert: IEEE Trans. Magn. 36 (2000) 3886.
  19. X. Li, J. N. Chapman, S. McVitie, and C. D. W. Wilkinson: Appl. Phys. Lett. 84 (2004) 4406[AIP Scitation].
  20. M. R. Scheinfein and J. L. Blue: J. Appl. Phys. 69 (1991) 7740[AIP Scitation].

|TOP|  |Previous Article| |Next Article|  |Table of Contents| |JJAP Home|
Copyright © 2013 The Japan Society of Applied Physics
Contact Information