Jpn. J. Appl. Phys. 47 (2008) pp. 2265-2269  |Previous Article| |Next Article|  |Table of Contents|
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Ultrahigh-Resolution Vacuum Ultraviolet Light Source System for Extremely Low Energy Photoelectron Spectroscopy

Gen Funabashi, Hidenori Fujiwara, Akira Sekiyama, Masami Hasumoto¹, Takahiro Ito¹, Shin-ichi Kimura¹, Peter Baltzer², and Shigemasa Suga

(Received October 15, 2007; accepted January 4, 2008; published online April 18, 2008)

We propose an efficient monochromatization method for the new ultrahigh-resolution Ar, Kr, and Xe light sources to be used for extremely low energy photoelectron spectroscopy (ELEPES). By fully utilizing the short-wavelength transmittance limits known as the Urbach tail of LiF, CaF₂, and sapphire, we can extract only the longest wavelength lines of the resonance lamp with Ar, Kr, and Xe gases by using LiF heated up to ∼50 °C as well as CaF₂ and sapphire at room temperature. The full width at half maximum of the longest wavelength Xe I resonance line is found to be narrower than 500 µeV. Using these light sources, we can perform ELEPES in laboratories at three photon energies with ultrahigh energy resolution and high efficiency.

URL: http://jjap.jsap.jp/link?JJAP/47/2265/
DOI: 10.1143/JJAP.47.2265

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