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Jpn. J. Appl. Phys. 47 (2008) pp. 3311-3325  |Next Article|  |Table of Contents|
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Invited Review Paper

Scanning Nonlinear Dielectric Microscopy Nano-Science and Technology for Next Generation High Density Ferroelectric Data Storage

Kenkou Tanaka, Yuichi Kurihashi, Tomoya Uda, Yasuhiro Daimon, Nozomi Odagawa, Ryusuke Hirose, Yoshiomi Hiranaga, and Yasuo Cho

Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

(Received September 12, 2007; accepted January 9, 2008; published online May 16, 2008)

An investigation of ultrahigh-density ferroelectric data storage based on scanning nonlinear dielectric microscopy (SNDM) is described. To obtain fundamental knowledge of high-density ferroelectric data storage, several studies of nanodomain formation in a congruent lithium tantalate single crystal were conducted. This paper is a summary report consisting of the most recent experimental data from investigations of ferroelectric high density data storage.

URL: http://jjap.jsap.jp/link?JJAP/47/3311/
DOI: 10.1143/JJAP.47.3311


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References | Citing Articles (30)

  1. K. Matsuura, Y. Cho, and R. Ramesh: Appl. Phys. Lett. 83 (2003) 2650[AIP Scitation].
  2. C. F. Pulvari and D. C. Washington: U.S. Patent 2,698,928 (1955); Application in 1951.
  3. J. R. Anderson: Electr. Eng. (1952) 916.
  4. J. C. Crawford: Trans. IEEE Electron Devices 18 (1971) 951.
  5. H. Tanaka and R. Sato: Shingakuron 52-A (1969) 436 [in Japanese].
  6. H. Niitsuma and R. Sato: Ferroelectrics 34 (1981) 37.
  7. P. Guthner and K. Dransfeld: Appl. Phys. Lett. 61 (1992) 1137[AIP Scitation].
  8. T. Hidaka, T. Maruyama, M. Satoh, N. Mikoshiba, M. Shimizu, T. Shiozaki, L. A. Wills, R. Hiskes, S. A. Dicarolis, and J. Amano: Appl. Phys. Lett. 68 (1996) 2358[AIP Scitation].
  9. A. L. Gruverman, J. Hatano, and H. Tokumoto: Jpn. J. Appl. Phys. 36 (1997) 2207[JSAP].
  10. L. M. Eng, M. Bammerlin, C. H. Loppacher, M. Guggisberg, R. Bennewitz, R. Luthi, E. Meyer, TH. Huser, H. Heinzelmann, and H.-J. Guntherodt: Ferroelectrics 222 (1999) 153.
  11. P. Paruch, T. Tybell, and J.-M. Triscone: Appl. Phys. Lett. 79 (2001) 530[AIP Scitation].
  12. Y. Cho, A. Kirihara, and T. Saeki: Trans. IEICE Electron. J78-C-1 (1995) 593 [in Japanese].
  13. Y. Cho, A. Kitahara, and T. Saeki: Rev. Sci. Instrum. 67 (1996) 2297[AIP Scitation].
  14. Y. Cho, S. Atsumi, and K. Nakamura: Jpn. J. Appl. Phys. 36 (1997) 3152[JSAP].
  15. Y. Cho, S. Kazuta, and K. Matsuura: Appl. Phys. Lett. 75 (1999) 2833[AIP Scitation].
  16. Y. Cho: Advances in Imaging and Electron Physics (Elsevier, Amsterdam, 2003) Vol. 127, p. 1.
  17. Y. Cho: Jpn. J. Appl. Phys. 46 (2007) 4428[JSAP].
  18. R. Hirose, K. Ohara, and Y. Cho: Nanotechnology 18 (2007) 084014[IoP STACKS].
  19. Y. Cho and R. Hirose: Phys. Rev. Lett. 99 (2007) 186101[APS].
  20. K. Matsuura, Y. Cho, and H. Odagawa: Jpn. J. Appl. Phys. 40 (2001) 3534[JSAP].
  21. Y. Cho, S. Kazuta, and K. Matsuura: Jpn. J. Appl. Phys. 38 (1999) 5689[JSAP].
  22. K. Matsuura, Y. Cho, and H. Odagawa: Jpn. J. Appl. Phys. 40 (2001) 4354[JSAP].
  23. Y. Cho, K. Fujimoto, Y. Hiranaga, Y. Wagatsuma, A. Onoe, K. Terabe, and K. Kitamura: Appl. Phys. Lett. 81 (2002) 4401[AIP Scitation].
  24. Y. Cho, K. Fujimoto, Y. Hiranaga, Y. Wagatsuma, A. Onoe, K. Terabe, and K. Kitamura: Nanotechnology 14 (2003) 637[IoP STACKS].
  25. Y. Hiranaga, Y. Cho, K. Fujimoto, Y. Wagatsuma, and A. Onoe: Jpn. J. Appl. Phys. 42 (2003) 6050[JSAP].
  26. K. Fujimoto and Y. Cho: Appl. Phys. Lett. 83 (2003) 5265[AIP Scitation].
  27. Y. Hiranaga, Y. Wagatsuma, and Y. Cho: Jpn. J. Appl. Phys. 43 (2004) L569[JSAP].
  28. Y. Hiranaga and Y. Cho: Jpn. J. Appl. Phys. 43 (2004) 6632[JSAP].
  29. Y. Hiranaga and Y. Cho: Jpn. J. Appl. Phys. 44 (2005) 6960[JSAP].
  30. Y. Cho: Jpn. J. Appl. Phys. 44 (2005) 5339[JSAP].
  31. Y. Hiranaga, K. Tanaka, and Y. Cho: Jpn. J. Appl. Phys. 45 (2006) 2220[JSAP].
  32. Y. Daimon and Y. Cho: Jpn. J. Appl. Phys. 45 (2006) L1304[JSAP].
  33. Y. Daimon and Y. Cho: Appl. Phys. Lett. 90 (2007) 192906[AIP Scitation].
  34. N. Odagawa and Y. Cho: Appl. Phys. Lett. 89 (2006) 102906[AIP Scitation].
  35. N. Odagawa and Y. Cho: Appl. Phys. Lett. 89 (2006) 192906[AIP Scitation].
  36. K. Tanaka, Y. Hiranaga, and Y. Cho: Ferroelectrics 340 (2006) 99.
  37. Y. Hiranaga, T. Uda, Y. Kurihashi, K. Tanaka, and Y. Cho: IEEE Trans. Ultrason. Ferroelectr. Freq. Control 54 (2007) 2523.
  38. U. Dürig, G. Cross, M. Despont, U. Drechsler, W. Häberle, M. I. Lutwyche, H. Rothuizen, R. Stutz, R. Widmer, P. Vettiger, G. K. Binnig, W. P. King, and K. E. Goodson: Tribology Lett. 9 (2000) 25.
  39. H. Shin, S. Hong, J. Moon, and J. U. Jeon: Ultramicroscopy 91 (2002) 103.
  40. Y. Nakagawa: in Roadmap of Scanning Probe Microscopy, ed. S. Morita (Springer, New York, 2006) p. 39.
  41. Y. Ishibashi and I. Suzuki: J. Phys. Soc. Jpn. 53 (1984) 1093.
  42. Y. Cho and K. Ohara: Appl. Phys. Lett. 79 (2001) 3842[AIP Scitation].
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