Jpn. J. Appl. Phys. 47 (2008) pp. 337-341 |Previous Article| |Next Article| |Table of Contents|
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Fabrication of Poly(tetrafluoroethylene) Microparts by High-Energy X-ray-Induced Etching
Yoshiaki Ukita,
Mitsuyoshi Kishihara1,
Kazuhiro Kanda,
Shinji Matsui,
Kozo Mochiji2, and
Yuichi Utsumi
Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo, Kamigori, Hyogo 678-1205, Japan
1Faculty of Computer Science and System Engineering, Okayama Prefectural University, Soja, Okayama 719-1197, Japan
2Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2280, Japan
(Received October 30, 2006; accepted October 3, 2007; published online January 18, 2008)
Poly(tetrafluoroethylene) (PTFE) microstructures' processing characteristics are studied using X-ray photo-decomposition and desorption in the highest energy region (2 to over 12 keV). While the exposed surface states are observed to melt and boil from the remaining bubble structure on the irradiated surface, the basic photochemistry of PTFE is considered to be the same as that described in previous reports, and high-aspect-ratio structures are successfully formed. We developed new Ni-electroformed stencil masks and successfully fabricated the first and practical example of PTFE microfluidic part. The characteristics of the fabricated microfluidic part, a PTFE fluid filter for vertical fluid flow operation, which works as a passive valve, agreed with the calculated results. This suggests that the accuracy of the patterning is adequate for the application of this technique to the fabrication of microfluidic parts and various other microparts.
URL:
http://jjap.jsap.jp/link?JJAP/47/337/
DOI: 10.1143/JJAP.47.337
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