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Jpn. J. Appl. Phys. 47 (2008) pp. 4687-4691  |Previous Article| |Next Article|  |Table of Contents|
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Formation of Hydrophobic and Water-Repellent Surface on Polyester Fibers using Ar/Hexamethyldisiloxane Plasma at Atmosperic Pressure

Young Yeon Ji1,3, Hong Ki Chang1, Yong Cheol Hong2,3, and Suck Hyun Lee3

1Center for Plasma Technology, Institute for Advanced Engineering, 633-2 Goan-ri, Baegam-Myeon, Cheoin-gu, Yongin 449-863, Korea
2Plasma Laboratory, Odeur System Korea Co., Ltd., Shinyoung Royal Palace, 249-6 Nonhyun-dong, Kangnam-gu, Seoul 135-832, Korea
3Department of Molecular Science and Technology, Ajou University, San 5, Wonchon-dong, Youngtong-gu, Suwon 443-749, Korea

(Received September 7, 2007; revised December 26, 2007; accepted January 29, 2008; published online June 13, 2008)

In this study, surface modification of polyester fibers with high water repellency was obtained by plasma treatment. Polyester fibers with water repellency were treated with atmospheric pressure middle-frequency (MF) plasma system using Ar and hexamethyldisiloxane (HMDSO). Ar gas has been used as the carrier gas. The surface morphologies of plasma-treated fibers were characterized by scanning electron microscopy (SEM). The Fourier transform infrared (FTIR) spectrometry was carried out to analyze the chemical composition of the polymer surface.

URL: http://jjap.jsap.jp/link?JJAP/47/4687/
DOI: 10.1143/JJAP.47.4687


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References | Citing Articles (3)

  1. H. Yasuda: Plasma Polymerization (Academic Press, London, 1985).
  2. R. Szeto and D. W. Hess: J. Appl. Phys. 52 (1981) 903[AIP Scitation].
  3. H. Bieddrman and Y. Osada: Plasma Polymerization Processes (Elsevier, Amsterdam, 1992) Chap. 7.
  4. N. Inagaki: Plasma Surface Modification and Plasma Polymerization (Technomic Publishing, Lancaster, U.K., 1996) Chaps. 5 and 6.
  5. K. Harada: J. Appl. Polym. Sci. 26 (1981) 3707.
  6. G. Grundmeier, P. Thiemann, J. Carpentier, and V. Barranco: Surf. Coat. Technol. 174–175 (2003) 996.
  7. H. Yasuda and Y. Matsuzawa: Plasma Process. Polym. 2 (2005) 507.
  8. Q. Zhang, J. Wanga, G. Wua, J. Shena, and S. Buddhudu: Mater. Chem. Phys. 72 (2001) 56.
  9. D. Çökeliler and M. Mutlu: Anal. Chim. Acta 469 (2002) 217.
  10. G. H. Yang, Y. Zhang, E. T. Kang, K. G. Neoh, W. Huang, and J. H. Teng: J. Phys. Chem. B 107 (2003) 8592[CrossRef].
  11. X. P. Zou, E. T. Kang, K. G. Neoh, Y. Zang, K. L. Tan, C. Q. Cui, and Y. B. Lim: Polym. Adv. Technol. 12 (2001) 583.
  12. R. Li, L. Ye, and Y. W. Mai: Composites A 28 (1997) 73.
  13. P. Favia, E. Sardella, R. Gristina, and A. Mile: Surf. Coat. Technol. 169 (2003) 707.
  14. S. Shibuchi, T. Yamamoto, T. Onda, and K. Tsujii: J. Colloid Interface Sci. 208 (1998) 287.
  15. L. Francesch, E. Garreta, M. Balcells, E. R. Edelman, and S. Borros: Plasma Processes Polym. 2 (2005) 605.
  16. E. Kokkoli and C. F. Zukoski: J. Colloid Interface Sci. 230 (2000) 176.
  17. W. Chen, A. Y. Fadeev, M. C. Hsieh, D. Öner, J. Youngblood, and T. J. McCarthy: Langmuir 15 (1999) 3395.
  18. I. Woodward, W. C. E. Schofield, V. Roucoules, and J. P. S. Badyal: Langmuir 19 (2003) 3432.
  19. J. K. Evju, P. B. Howell, L. E. Locasicio, M. J. Tarlov, and J. Hickman: Appl. Phys. Lett. 84 (2004) 1668[AIP Scitation].
  20. S. M. Mukhopadhyay, P. Joshi, S. Datta, and J. Macdaniel: Appl. Surf. Sci. 201 (2002) 219[CrossRef].
  21. C. L. Ricketts, A. E. Wallis, J. C. Whitehead, and K. Zhang: J. Phys. Chem. A 108 (2004) 8341[CrossRef].
  22. G. Cicala, A. Milella, F. Palumbo, P. Favia, and R. d'Agostino: Diamond Relat. Mater. 12 (2003) 2020.
  23. C. L. Rinsch, C. Chen, V. Panchaligam, R. C. Eberhart, J. H. Wang, and R. B. Tonnons: Langmuir 12 (1996) 2995.
  24. K. Aumaille, C. Vallee, A. Granier, A. Goullet, F. Gaboriau, and G. Turban: Thin Solid Films 359 (2000) 188[CrossRef].
  25. D. S. Wavhal, J. Zhang, M. L. Steen, and E. R. Fisher: Plasma Processes Polym. 3 (2006) 276.
  26. M. L. Zheludkevich, R. Serra, G. Grundmeier, L. H. Yang, and M. G. S. Ferreira: Surf. Coat. Technol. 200 (2006) 4040.
  27. A. Bellel, S. Sahli, Z. Ziari, P. Raynaud, Y. Segui, and D. Escaich: Surf. Coat. Technol. 201 (2006) 129.
  28. S. Guimond and M. R. Wertheimer: J. Appl. Polym. Sci. 94 (2004) 1291.
  29. A. Schutze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn, and R. F. Hicks: IEEE Trans. Plasma Sci. 26 (1998) 1685.
  30. H. W. Hermann, I. Henins, J. Park, and G. S. Selwyn: Phys. Plasmas 6 (1999) 2284.
  31. L. J. Ward, W. C. E. Schofield, and J. P. S. Badyal: Langmuir 19 (2003) 2110.
  32. T. Yamamoto, M. Okubo, N. Imai, and Y. Mori: Plasma Chem. Plasma Process. 24 (2004) 1.
  33. American Association of Textile Chemists and Colorists (AATCC) Technical Manual (1983) Vol. 58, p. 248.
  34. G. Socrates: Infrared Characteristic Group Frequencies Tables and Charts (Wiley, New York, 1994) 2nd ed.
  35. K. Kashiwagi, Y. Yoshida, and Y. Murayama: Jpn. J. Appl. Phys. 30 (1991) 1803[JSAP].
  36. A. M. Wrobel, G. Czeremuszkin, H. Szymanowski, and J. Kowalski: Plasma Chem. Plasma Process. 10 (1990) 277.
  37. K. Hamada and H. Morishita: Spectrosc. Lett. 16 (1983) 717.
  38. M. Goujon, T. Belmonte, and G. Hention: Surf. Coat. Technol. 188–189 (2004) 756.
  39. M. Jasso, H. Krump, I. Hudec, P. Stahel, D. Kovacik, and M. Sira: Surf. Coat. Technol. 201 (2006) 57.
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