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Jpn. J. Appl. Phys. 48 (2009) 011301 (6 pages)  |Previous Article| |Next Article|  |Table of Contents|
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Temperature-Dependent Transfer Characteristics of Amorphous InGaZnO4 Thin-Film Transistors

Kazushige Takechi, Mitsuru Nakata, Toshimasa Eguchi, Hirotaka Yamaguchi1, and Setsuo Kaneko1,2

Technology Research Association for Advanced Display Materials (TRADIM), Koganei, Tokyo 184-0012, Japan
1NEC LCD Technologies, Ltd., Kawasaki 211-8666, Japan
2NEC Corporation, Kawasaki 211-8666, Japan

(Received July 14, 2008; accepted October 13, 2008; published online January 20, 2009)

The transfer characteristics of amorphous InGaZnO4 thin-film transistors (a-IGZO TFTs) were measured at temperatures ranging from 298 to 523 K in order to analyze the behavior of the above-threshold (ON state) and subthreshold regions. For comparison, the transfer characteristics of a hydrogenated amorphous silicon TFT (a-Si:H TFT) were measured in the same temperature range. We developed a simple analytical model that relates the threshold voltage (Vt) decrease due to increasing temperature to the formation of point defects in a-IGZO. It is well known that the formation of point defects results in the generation of free carriers in oxide semiconductors. Incorporating the analytical model with the experimental transfer characteristics data taken at high temperatures over 423 K, we estimated the formation energy to be approximately 1.05 eV. The Vt decrease because of the generation of point defects is peculiar to a-IGZO TFTs, which is not observed in a-Si:H TFTs. The results for the ON-current activation energy suggested that the density of tail states for a-IGZO is much lower than that for a-Si:H.

URL: http://jjap.jsap.jp/link?JJAP/48/011301/
DOI: 10.1143/JJAP.48.011301


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