Jpn. J. Appl. Phys. 48 (2009) 056508 (4 pages)  |Table of Contents|
|Abstract| |Full Text PDF: OPEN SELECT (120K)|

Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation

Takahiro Kozawa, Kazumasa Okamoto, Akinori Saeki, and Seiichi Tagawa

Articles citing this article

The list of citing articles is based on data provided by CrossRef Cited-by Linking. Any errors or omissions are the responsibility of the primary publisher.

1. Applied Physics Express 5 (2012) 096701

   Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser

   Kazumasa Okamoto, Takahiro Kozawa, Keita Oikawa, Takaki Hatsui, Mitsuru Nagasono, Takashi Kameshima, Tadashi Togashi, Kensuke Tono, Makina Yabashi, Hiroaki Kimura, Yasunori Senba, Haruhiko Ohashi, Ryoko Fujiyoshi, and Takashi Sumiyoshi

2. Applied Physics Letters 101 (2012) 033106

   Eco-friendly electron beam lithography using water-developable resist material derived from biomass

   Satoshi Takei, Akihiro Oshima, Takanori Wakabayashi, Takahiro Kozawa, and Seiichi Tagawa

3. Applied Physics Express 4 (2011) 026501

   Feasibility Study of Chemically Amplified Resists for Short Wavelength Extreme Ultraviolet Lithography

   Takahiro Kozawa and Andreas Erdmann

4. Applied Physics Express 4 (2011) 106502

   Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer

   Satoshi Takei, Akihiro Oshima, Atsushi Sekiguchi, Naomi Yanamori, Miki Kashiwakura, Takahiro Kozawa, and Seiichi Tagawa

5. Applied Physics Express 4 (2011) 126501

   Wavelength Dependence of Lithography Resolution in Extreme Ultraviolet Region

   Takahiro Kozawa and Toshiro Itani

6. Japanese Journal of Applied Physics 50 (2011) 036505

   Relationship of Electron Diffusion Length to Line Edge Roughness in Chemically Amplified Extreme Ultraviolet Resists

   Takahiro Kozawa and Seiichi Tagawa

7. Japanese Journal of Applied Physics 49 (2010) 030001

   Radiation Chemistry in Chemically Amplified Resists

   Takahiro Kozawa and Seiichi Tagawa