Jpn. J. Appl. Phys. 48 (2009) 06FH11 (4 pages) |Previous Article| |Next Article| |Table of Contents|
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Application of Nanoimprint Lithography to Fabrication of Distributed Feedback Laser Diodes
Transmission Devices R&D Laboratories, Sumitomo Electric Industries, Ltd., 1, Taya-cho, Sakae-ku, Yokohama 244-8588, Japan
(Received December 8, 2008; accepted February 5, 2009; published online June 22, 2009)
We have succeeded in employing nanoimprint lithography (NIL) to form the diffraction gratings of distributed feedback laser diodes (DFB LDs) used in optical communication. Uniform gratings and phase-shifted gratings with periods of 232 nm have been formed by using a reversal-tone NIL with a step-and-repeat imprint tool. Line edge roughness has been sufficiently low with the fabricated gratings. DFB LDs fabricated by NIL have indicated comparable characteristics with LDs fabricated by electron beam lithography. We have also demonstrated that phase-shifted DFB LDs show better uniformity in characteristics than uniform-grating DFB LDs. The results of this study indicate that NIL has high potential for the fabrication of DFB LDs.
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