Jpn. J. Appl. Phys. 49 (2010) 021005 (3 pages)  |Table of Contents|
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Very Low Ohmic Contact Resistance through an AlGaN Etch-Stop in Nitrogen-Polar GaN-Based High Electron Mobility Transistors

Nidhi, David F. Brown, Stacia Keller, and Umesh K. Mishra

Articles citing this article

The list of citing articles is based on data provided by CrossRef Cited-by Linking. Any errors or omissions are the responsibility of the primary publisher.

  1. IEEE Electron Device Letters 32 (2011) 134
    RF Performance of Deep-Recessed N-Polar GaN MIS-HEMTs Using a Selective Etch Technology Without Ex Situ Surface Passivation
    Seshadri Kolluri, David F. Brown, Man Hoi Wong, S. Dasgupta, Stacia Keller, Steven P. DenBaars, and Umesh K. Mishra


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