Jpn. J. Appl. Phys. 49 (2010) 056201 (6 pages)  |Previous Article| |Next Article|  |Table of Contents|
|Full Text PDF (1046K)| |Buy This Article|

Structure and Expansion Characteristics of Laser Ablation Tin Plasma into a Vacuum

Qiushi Zhu, Junzaburo Yamada, Nozomu Kishi, Tomonao Hosokai, Masato Watanabe, Akitoshi Okino, Kazuhiko Horioka, and Eiki Hotta

(Received November 2, 2009; accepted February 16, 2010; published online May 20, 2010)

The internal structure and expansion characteristics of a laser ablation tin plasma into a vacuum have been investigated. A Q-switched Nd:YAG laser with the power density of 10¹¹ W/cm² at the focal spot on the tin bulk target was employed to create the ablation plasma. The ion velocity distribution calculated from the time-of-flight measurements displays a multimodal structure; shifted-Maxwell–Boltzmann fitting indicates ions with multiple charge states exist in the ablation plume, and the temperature of the Knudsen layer was estimated to be ∼4.0×10⁵ and ∼8.3×10⁵ K for the laser energy of 77 and 129 mJ, respectively. Particle acceleration mechanisms were discussed according to the time resolved, two-dimensional images of the Sn I and Sn II plasma plume. The unstable adiabatic expansion with the formation of Knudsen layer was found dominates the expansion behavior of Sn I, and the Knudsen layer temperature was calculated to be 6.68×10⁵ K according to the front edge velocity of the Sn I plume.

URL: http://jjap.jsap.jp/link?JJAP/49/056201/
DOI: 10.1143/JJAP.49.056201

References | Citing Article (1)

1. P. J. Silverman: J. Microlithogr. Microfabr. Microsyst. 4 (2005) 011006.
2. T. Yokoyama, H. Mizokoshi, Y. Teramoto, D. Yamatani, H. Sato, and K. Hotta: presented at Int. Symp. Extreme Ultraviolet Lithography, 2008.
3. E. Hotta, N. Kishi, J. Yamada, Q. Zhu, T. Hosokai, M. Watanabe, and A. Okino: presented at Int. Symp. Extreme Ultraviolet Lithography, 2008.
4. V. Bakshi: EUV Sources for Lithography (SPIE Press, Bellingham, WA, 2008) Chap. 1, p. 3.
5. J. Pankert, R. Apetz, K. Bergmann, G. Derra, M. Janssen, J. Jonkers, J. Klein, T. Kruecken, A. List, M. Loeken, C. Metzmacher, W. Neff, S. Probst, R. Prummer, O. Rosier, S. Seiwert, G. Siemons, D. Vaudrevange, D. Wagemann, A. Weber, P. Zink, and O. Zitzen: Proc. SPIE 5751 (2005) 260[AIP Scitation].
6. T. Higashiguchi, M. Hamada, and S. Kubodera: Rev. Sci. Instrum. 78 (2007) 036106[AIP Scitation].
7. N. R. Farrar, D. C. Brandt, I. V. Fomenkov, A. I. Ershov, N. R. Bowering, W. N. Partlo, D. W. Myers, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, and C. P. Chrobak: Microelectron. Eng. 86 (2009) 509.
8. S. S. Harilal, B. O'Shay, M. S. Tillack, Y. Tao, R. Paguio, A. Nikroo, and C. A. Back: J. Phys. D 39 (2006) 484[IoP STACKS].
9. D. B. Chrisey and G. K. Hubler: Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994) p. 388.
10. M. S. Tillack, D. W. Blair, and S. S. Harilal: Nanotechnology 15 (2004) 390[IoP STACKS].
11. S. Arepalli: J. Nanosci. Nanotechnol. 4 (2004) 317.
12. C. V. Bindhu, S. S. Harilal, M. S. Tillack, F. Najmabadi, and A. C. Gaeris: Appl. Spectrosc. 58 (2004) 719.
13. Y. Tao, M. S. Tillack, S. S. Harilal, K. L. Sequoia, and F. Najmabadi: J. Appl. Phys. 101 (2007) 023305[AIP Scitation].
14. S. Fujioka, H. Nishimura, K. Nishihara, A. Sasaki, A. Sunahara, T. Okuno, N. Ueda, T. Ando, Y. Tao, Y. Shimada, K. Hashimoto, M. Yamaura, K. Shigemori, M. Nakai, K. Nagai, T. Norimatsu, T. Nishikawa, N. Miyanaga, Y. Izawa, and K. Mima: Phys. Rev. Lett. 95 (2005) 235004[APS].
15. S. S. Harilal, B. O'Shay, M. S. Tillack, and M. V. Mathew: J. Appl. Phys. 98 (2005) 013306[AIP Scitation].
16. T. Higashiguchi, C. Rajyaguru, N. Dojyo, Y. Taniguchi, K. Sakita, S. Kubodera, and W. Sasaki: Rev. Sci. Instrum. 76 (2005) 126102[AIP Scitation].
17. A. Takahashi, D. Nakamura, K. Tamaru, T. Akiyama, and T. Okada: Appl. Phys. B 92 (2008) 73[CrossRef].
18. R. Kelly and R. W. Dreyfus: Surf. Sci. 198 (1988) 263[CrossRef].
19. R. Kelly and R. W. Dreyfus: Nucl. Instrum. Methods Phys. Res., Sect. B 32 (1988) 341.
20. H. Horisawa and I. Kimura: Vacuum 65 (2002) 389.
21. R. Kelly: Phys. Rev. A 46 (1992) 860[APS].
22. D. Sibold and H. M. Urbassek: Phys. Rev. A 43 (1991) 6722[APS].
23. R. Kelly: J. Chem. Phys. 92 (1990) 5047[AIP Scitation].