Jpn. J. Appl. Phys. 49 (2010) 05EA02 (4 pages)  |Previous Article| |Next Article|  |Table of Contents|
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Physical and Electrical Properties of SiO₂ Layer Synthesized by Eco-Friendly Method

Jong-Woong Kim, Young-Seok Kim, Sung-Jei Hong, Tae-Hwan Hong¹, and Jeong-In Han

(Received November 10, 2009; accepted February 12, 2010; published online May 20, 2010)

SiO₂ thin film has a wide range of applications, including insulation layers in microelectronic devices, such as semiconductors and flat panel displays, due to its advantageous characteristics. Herein, we developed a new eco-friendly method for manufacturing SiO₂ nanoparticles and, thereby, SiO₂ paste to be used in the digital printing process for the fabrication of SiO₂ film. By excluding harmful Cl^- and NO₃^- elements from the SiO₂ nanoparticle synthetic process, we were able to lower the heat treatment temperature for the SiO₂ precursor from 600 to 300 °C and the diameter of the final SiO₂ nanoparticles to about 14 nm. The synthesized SiO₂ nanoparticles were dispersed in an organic solvent with additives to make a SiO₂ paste for feasibility testing. The SiO₂ paste was printed onto a glass substrate to test the feasibility of using it for digital printing. The insulation resistance of the printed film was high enough for it to be used as an insulation layer for passivation.

URL: http://jjap.jsap.jp/link?JJAP/49/05EA02/
DOI: 10.1143/JJAP.49.05EA02

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