Jpn. J. Appl. Phys. 49 (2010) 06GL04 (4 pages)  |Previous Article| |Next Article|  |Table of Contents|
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Effects of Environmental Gas in UV Nanoimprint on the Characteristics of UV-Curable Resin

Qing Wang^1,2 and Hiroshi Hiroshima^1,2

(Received November 24, 2009; accepted February 16, 2010; published online June 21, 2010)

In this study we investigated the effects of ambient gas on the characteristics of UV-curable resin in UV nanoimprint process by comparing the pattern transfer fidelity and residual layer thicknesses of the samples carried out in air and pentafluoropropane gas. We found that the resin pattern shrinkage induced by UV exposure was markedly affected by the ambient gas environment. The pattern shrinkage reached 22% in pentafluoropropane, while it reached only 3% in air. Also, the effects of pentafluoropropane on residual layer thickness were investigated. It was found that the residual layer using pentafluoropropane was much thinner than could be expected from the shrinkage induced by pentafluoropropane alone. We believe that the thinning of the residual layer is caused not only by shrinkage, but also by a decrease in the viscosity of UV-curable resin.

URL: http://jjap.jsap.jp/link?JJAP/49/06GL04/
DOI: 10.1143/JJAP.49.06GL04

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