Jpn. J. Appl. Phys. 49 (2010) 106505 (4 pages)  |Previous Article| |Next Article|  |Table of Contents|
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Resin Elongation Phenomenon of Polystyrene Nanopillars in Nanoimprint Lithography

Kosuke Kuwabara^1,2, Akihiro Miyauchi¹, and Hiroyuki Sugimura²

(Received May 14, 2010; accepted July 17, 2010; published online October 20, 2010)

We investigated the elongation of polystyrene nanopillars formed by thermal nanoimprint lithography. Silicone and perfluoropolyether were used as mold release agents to obtain molds with different adhesion forces against polystyrene to be imprinted. The adhesion force between the resin and release layers was evaluated as a force curve by atomic force microscope with a polystyrene colloid probe. Elongation depended on the aspect ratio of the corresponding microholes on the mold and the adhesion force against the release layer. The conditions under which the elongation occurred exhibited a clear threshold on the stress loaded on the foot area of the nanopillars.

URL: http://jjap.jsap.jp/link?JJAP/49/106505/
DOI: 10.1143/JJAP.49.106505

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