Jpn. J. Appl. Phys. 5 (1966) pp. 59-67 |Next Article| |Table of Contents|
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Electron Diffraction at Low Temperature I. Apparatus and Preliminary Results
Research Institute for Iron, Steel and Other Metals Tohoku University
(Received September 30, 1965)
An electron diffraction apparatus has been constructed for studies at low temperature down to 4.2°K. In this apparatus, a specimen holder is attached to a bottom of a small cryostat, into which liquid helium is poured from a storage vessel through a transfer tube. The specimen temperature is controlled mainly by adjusting the flowing quantity of liquid helium and sometimes by the operations of a small electrical heater. The construction and characteristics of the apparatus are presented.
Preliminary results on bismuth, gallium, Pb-12%Bi and beryllium films prepared by the low temperature condensation are also described. The present results on bismuth and gallium are different in some respects from those of a previous researcher. Correspondence between change of a state of atomic aggregate and anomalies of electrical resistance are confirmed in the cases of Pb-12%Bi and beryllium films prepared by low temperature condensation.
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